Structural, Optical and Electrical Properties of Electron Beam Evaporated Tioxny Films as Selective Solar Absorber Coatings

Abstract

Titanium oxinitride (TiOx Ny ) solar absorber coatings were deposited at different oxygen partial pressures onto Cu, Si and glass substrates using electron beam evaporation technique. XRD diffraction patterns evidenced (111), (200) and (220) orientation of TiNx phase. The preferred orientation of the films changed with oxygen partial pressure. XPS revealed the intensity of both Ti 2P3/2 and Ti 2P1/2 increases as a function of oxygen flow, and also shifted towards higher binding energy, indicating more oxidized state of Ti species than that of TiO2 due to incorporation of nitrogen atoms. Formation of uniformly distributed spherical like particles and an increase in surface roughness of the TiOx Ny films were observed as a function of oxygen partial pressure as depicted from SEM and AFM, respectively. Ellipsometric and resistivity measurements showed a shift from metallic to semiconductor behaviour of the TiOx Ny films as oxygen flow changed. A solar absorptance value of 0.94 in the solar spectrum region and a low thermal emittance value of 0.05 were achieved for the TiOx Ny solar absorber coatings prepared at the oxygen partial pressure of 7.5x10-5 Torr due to both interference and intrinsic absorption. This study confirmed that a single layer of TiOx Ny film can be a good candidate as selective solar absorber.