Structural, Optical and Electrochromic Properties of Sputter Deposited Tungsten Oxide Films in Argon-Helium Atmosphere

Abstract

Tungsten oxide (WO3) films have been deposited on glass substrates by radio frequency magnetron sputtering of tungsten target. We examined the effect of oxygen flow rate in argon and helium atmosphere on the structural, optical, and electrochromic properties of WO3 films. When helium gas is replaced with argon, the particle sizes and the band gap will get affected. Band gap values were obtained over a range of 2.62 eV to 3.09 eV. The atomic mass of the sputtering gas also plays a prime role in changing the primary crystallite size, orientation, as well as band gap. We could relate the crystallization of tungsten atoms with low oxygen flow rate when films are deposited in helium instead of argon due to Penning ionization.

Effects of substrate temperature and sputtering gas composition on physical properties and photocatalytic activities of WOx thin films deposited via radiofrequency sputtering

“…This is because several stoichiometrically oxygen-deficient WOx phases possibly mixed with WO 3 in the low O 2 gas flow rate condition. 31) Figure 4 shows AFM images of the surface morphologies of the WOx thin films deposited with a substrate temperature of 573 K and with Ar:O 2 sputter gas flows of only Ar, 7:1, 2:1, and 1:1. Grains of various sizes were observed when the sputter gas was only Ar.…”

PRODUCTION OF NANOCOMPOSITE WO3/rGO ELECTROCHROMIC FILMS BY THE METHOD OF SPRAY-PYROLYSIS ON GLASS ITO SUBSTRATES

“…Развитие тонкопленочной технологии позволяет получать различные конфигурации электрохромных пленок [10; 11]. Существует широкий выбор методов получения электрохромных пленок WO 3 , например химическое осаждение из паровой фазы [1], вакуумное испарение [2], механическое напыление [8], золь-гель метод [5] и др. Однако отсутствует универсальная технология, удовлетворяющая всем существующим требованиям.…”