“…An example is presented in Figure 6 (right panel), in which the effect of XMCD provide differences in the reflected intensities measured with left (I − )-and right (I + )-hand-polarized beams with a large XRR difference, where ∆I = (I + − I − )/(I + + I − ). The contemporary analysis of several XRR patterns along with XMCD spectra permitted the authors to obtain an accurate characterization of the multilayer morphology, including the distribution of magnetic layers [87,[203][204][205] Overall, X-ray reflectivity is a valuable technique for interface characterization in thin films, providing crucial information about film thickness, density, composition, roughness, and interfacial structure. It is widely used in materials science, surface science, and thinfilm technology for understanding and optimizing thin-film properties and performance.…”