1998
DOI: 10.1103/physrevb.57.7027
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Structural properties and quasiparticle band structure of zirconia

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Cited by 338 publications
(236 citation statements)
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References 25 publications
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“…Although the 0 0 G W approximation is currently the state of the art approach to calculate defect levels for solids from first principles it has so far only been applied in a few cases [123][124][125][126][127][128]. Ideally the GW calculations would encompass the determination of the defect structure, too, but so far GW total energy calculations, that would be required for this task, are still in their infancy.…”
Section: Discussionmentioning
confidence: 99%
“…Although the 0 0 G W approximation is currently the state of the art approach to calculate defect levels for solids from first principles it has so far only been applied in a few cases [123][124][125][126][127][128]. Ideally the GW calculations would encompass the determination of the defect structure, too, but so far GW total energy calculations, that would be required for this task, are still in their infancy.…”
Section: Discussionmentioning
confidence: 99%
“…It is the most accurate method to calculate the corrections and is widely used. [24][25][26] However, it is computationally expensive. The B3YLP is a hybrid method combining the Hatree-Fock approximation and LDA.…”
Section: Methodsmentioning
confidence: 99%
“…H − acts similarly to H 0 . We also consider H in tetragonal ͑t-͒ HfO 2 , which has a 0.3 eV wider band gap than cubic HfO 2 , 25 as also seen in Table I. Nevertheless, H also acts as a donor in t-HfO 2 .…”
Section: Sno 2 and Tiomentioning
confidence: 99%
“…However, fundamental studies on the roles of ZrO 2 in these reactions using modern surface science techniques are often hampered by charging problems because of the poor electrical conductivity of bulk ZrO 2 ; the band gap of ZrO 2 is approximately 5 eV [4]. In order to overcome this difficulty and further investigate the catalytic properties of ZrO 2 , we adopt the commonly used method of epitaxial growth of an ordered thin oxide film on a metal single crystal surface to prepare ordered ZrO 2 thin films.…”
mentioning
confidence: 99%