2020 IEEE International Interconnect Technology Conference (IITC) 2020
DOI: 10.1109/iitc47697.2020.9515651
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Structural stability of tight-pitched damascene interconnects

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“…This coupled with a cohesive force analysis which shows that Cu has lower cohesive energy than the alternate metals implies that the alternate metals have a lower tendency to diffuse into the surrounding dielectric material, so they do not need a thick diffusion barrier unlike Cu [17]. On the other hand, this also implies that these alternate metals have a higher tendency to form surfaces, which may lead to pattern collapse at small pitches, as shown using finite-element analysis in [18], [19]. So, a trade-off between the advantages of lower resistance and improved reliability over Cu and the structural stability of these alternate metal interconnects needs to be analyzed.…”
Section: Introductionmentioning
confidence: 95%
“…This coupled with a cohesive force analysis which shows that Cu has lower cohesive energy than the alternate metals implies that the alternate metals have a lower tendency to diffuse into the surrounding dielectric material, so they do not need a thick diffusion barrier unlike Cu [17]. On the other hand, this also implies that these alternate metals have a higher tendency to form surfaces, which may lead to pattern collapse at small pitches, as shown using finite-element analysis in [18], [19]. So, a trade-off between the advantages of lower resistance and improved reliability over Cu and the structural stability of these alternate metal interconnects needs to be analyzed.…”
Section: Introductionmentioning
confidence: 95%