New polyhedral oligomeric silsesquioxanes (POSS), ( i BuSi) 7 O 12 SiOSi(Me) 2 CH 2 (CH 2 ) n CH 2 OC-(O)C(CH 3 )dCH 2 bearing one single methacrylate group, were synthesized by hydrosilylation of allylalcohol or 4-penten-1-ol, followed by acylation with methacryloyl chloride. All intermediates and final derivatives were carefully characterized by FTIR, 1 H, 13 C, and 29 Si solution state NMR, size exclusion chromatography (SEC), MALDI-TOF MS, and powder XRD (including full indexation of the diffraction patterns). In a second step, POSS/methacrylate based films were prepared. For 10 wt % of POSS, phase separation occurs with concomitant POSS crystallization. This behavior is not observed for 2 wt %, but XPS analyses show migration of POSS toward the film-air interface, which led to improved hydrophobic properties of the UV polymerized films with a 30°increase in contact angle.