Structure and electrical properties of ITO thin films deposited at high rate by facing target sputtering

Hoshi, Yoichi; Kato, H.; FUNATSU, Kentaro

doi:10.1016/s0040-6090(03)01182-9

Cited by 66 publications

(27 citation statements)

References 13 publications

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“…In terms of deposition, further development of high-end deposition techniques, such as ALD, low-temperature solution-based deposition processes, or new PVD system designs that avoid the direct exposure of the substrate to the plasma during deposition (e.g., high-density plasma-enhanced evaporation, [188,189] or facing target sputtering [190] ), is just one path to the development of ultra-high performance TCOs and TCOs/ device interfaces.…”

Section: Perspectivesmentioning

confidence: 99%

Transparent Electrodes for Efficient Optoelectronics

Morales‐Masis

Wolf

Woods‐Robinson

et al. 2017

Adv Elect Materials

364

288

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With the development of new generations of optoelectronic devices that combine high performance and novel functionalities (e.g., flexibility/bendability, adaptability, semi or full transparency), several classes of transparent electrodes have been developed in recent years. These range from optimized transparent conductive oxides (TCOs), which are historically the most commonly used transparent electrodes, to new electrodes made from nano‐ and 2D materials (e.g., metal nanowire networks and graphene), and to hybrid electrodes that integrate TCOs or dielectrics with nanowires, metal grids, or ultrathin metal films. Here, the most relevant transparent electrodes developed to date are introduced, their fundamental properties are described, and their materials are classified according to specific application requirements in high efficiency solar cells and flexible organic light‐emitting diodes (OLEDs). This information serves as a guideline for selecting and developing appropriate transparent electrodes according to intended application requirements and functionality.

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Section: Perspectivesmentioning

confidence: 99%

Transparent Electrodes for Efficient Optoelectronics

Morales‐Masis

Wolf

Woods‐Robinson

et al. 2017

Adv Elect Materials

364

288

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“…The PXRD patterns of the ITO-coated samples show a well defined (222) peak and to evidence other peaks, the pattern in the region 30°-60°was registered with a higher sensitivity. The films show the maximum intensity peak corresponding to the (222) orientation around 30.581°w hich is reported as favored direction of the grain growth observed for polycrystalline ITO films with higher oxygen content [29]. All other peaks observed were (211), (400), (411), (332), (431), (440), (611), and (622) appearing at 21.501°, 35.467°, 37.690°, 41.846°, 45.690°, 51.064°, 55.990°, and 61.680°, respectively.…”

Section: Atr-ftir Spectroscopymentioning

confidence: 80%

Study of conducting ITO thin film deposition on flexible polyimide substrate using spray pyrolysis

et al. 2015

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Nanostructured indium tin oxide (ITO) thin films have been grown by chemical spray pyrolysis method on flexible polyimide (PI) polymeric substrates at various temperatures (400, 450 and 500°C) using solutions of indium and tin chlorides as precursors. The composition, microstructure, surface morphology, thermal, electrical, and optical characteristics have been analysed by FT-IR, UV-Vis, X-ray diffraction, SEM, EDAX, atomic force microscopy, electrical measurements, TGA, etc. X-ray diffraction measurements employing Cu-Ka radiation showed that the ITO films were polycrystalline with a cubic bixbyite structure. An increment in average grain size, electrical conductivity and optical transmittance was observed at higher substrate temperature. ITO-coated films maintained the mechanical properties and stability of the pristine PI films. The adhesion between surface ITO layers and PI matrix was found acceptable. Graphical Abstract

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“…Although increasing the sputtering input power results in high kinetic energy of incident particles, it is necessary to improve the deposition rate and decrease the sputtering time synchronously [7]. Figure 5 shows the PL spectra of BAlq after ITO deposition below 10 mTorr Kr with an input power of 50 and 200 W. It should be noted that the PL intensity decreased only a little even when sputtering was performed using four times the power.…”

Section: Resultsmentioning

confidence: 99%

“…These results indicate that bombardment by high-energy ions and electrons causes considerable damage to the organic layer. FTS has been proven to be a good method for suppressing damage from negative oxygen ions and -electrons [5,7,8]. The set-up of a semi-sector-shaped metal shield on targets can also completely prevent damage from -electrons and enhance the photoluminescence properties of the organic layer [6].…”

Section: Methodsmentioning

confidence: 99%

Low Damage Sputter Deposition of ITO Films on Organic Light Emitting Films

Lei

Ichikawa

Hoshi

et al. 2009

Trans. Mat. Res. Soc. Japan

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Damage to an aluminum (III) bis(2-methyl-8-quninolinato)-4-phenylphenolate (BAlq) layer was investigated during indium-tin oxide (ITO) deposition using a facing target sputtering (FTS) system in which the bombardment of negative oxygen ions and -electrons onto the substrate can be completely suppressed. The photoluminescence (PL) intensity of BAlq was used to evaluate the damage on the organic layer after the deposition of an ITO thin film in Ar and Kr gas at different gas pressures and input power levels. The results suggest that the bombardment of reflected neutral atoms is not the main reason for the damage. The remnant damage from the bombardment of sputtered atoms can be reduced by sputtering at a higher gas pressure. Finally, the bombardment of the organic film by high-energy particles such as negative oxygen ions, -electrons, and sputter-emitted atoms was completely suppressed using an FTS system to attain low-damage and high-rate sputter ITO deposition.

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Structure and electrical properties of ITO thin films deposited at high rate by facing target sputtering

Cited by 66 publications

References 13 publications

Transparent Electrodes for Efficient Optoelectronics

Transparent Electrodes for Efficient Optoelectronics

Study of conducting ITO thin film deposition on flexible polyimide substrate using spray pyrolysis

Low Damage Sputter Deposition of ITO Films on Organic Light Emitting Films

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