Structure and hardness of vacuum arc deposited multi-component nitride coatings of Ti, Zr and Nb

Boxman, R.L.; Zhitomirsky, V.N.; Grimberg, I.; Rapoport, L.; Goldsmith, S.; Weiss, B. Z.

doi:10.1016/s0257-8972(99)00570-8

Cited by 72 publications

(31 citation statements)

References 19 publications

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“…The hardness of such films is much higher than the bulk material (HV¼14 GPa) and higher than other binary nitride films (TiN, ZrN, VN). The hardness of the NbN films deposited by different arc deposition systems reaches 34-49 GPa [8][9][10][11][12][13]. The NbN films were also prepared by using magnetron sputtering (MS) [14][15][16][17][18], ion Contents lists available at ScienceDirect journal homepage: www.elsevier.com/locate/ceramint beam assisted deposition [19], pulsed laser deposition [20].…”

Section: Introductionmentioning

confidence: 99%

Structural and mechanical properties of NbN and Nb-Si-N films: Experiment and molecular dynamics simulations

Pogrebnjak

Бондар

Abadias

et al. 2016

Ceramics International

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a b s t r a c tThe structural and mechanical properties of NbN and Nb-Si-N films have been investigated both experimentally and theoretically, in their as-deposited and annealed states. The films were deposited using magnetron sputtering at substrate bias (U B ) between 0 and À 70 V. While NbN films were found to crystallize in the cubic δ-NbN structure, Nb-Si-N films with Si content of 11-13 at% consisted of a twophases nanocomposite structure where δ-NbN nanocrystals were embedded in SiN x amorphous matrix.Films deposited at U B ¼0 V were highly (001)-textured. Application of substrate bias potential led to a depletion of light atoms, and caused a grain size refinement concomitantly with the increase of (111) preferred orientations in both films. The maximum hardness was 28 GPa and 32 GPa for NbN and Nb-Si-N films, respectively. NbN and Nb-Si-N films deposited at U B ¼ À70 V exhibited compressive stress of À 3 and À 4 GPa, respectively. After vacuum annealing, a decrease in the stress-free lattice parameter was observed for both films, and attributed to alteration of film composition. To obtain insights on interface properties and related mechanical and thermal stability of Nb-Si-N nanocomposite films, first principles molecular dynamics simulations of NbN/SiN x heterostructures with different structures (cubic and hexagonal) and atomic configurations were carried out. All the hexagonal heterostructures were found to be dynamically stable and weakly dependent on temperature. Calculation of the tensile strain-stress curves showed that the values of ideal tensile strength for the δ-NbN(111)-and ε-NbN(001)-based heterostructures with coherent interfaces and Si 3 N 4 -like Si 2 N 3 interfaces were the highest with values in the range 36-65 GPa, but lower than corresponding values of bulk NbN compound. This suggests that hardness enhancement is likely due to inhibition of dislocation glide at the grain boundary rather than interfacial strengthening due to Si-N chemical bonding.

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Section: Introductionmentioning

confidence: 99%

Structural and mechanical properties of NbN and Nb-Si-N films: Experiment and molecular dynamics simulations

Pogrebnjak

Бондар

Abadias

et al. 2016

Ceramics International

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“…Vacuum-arc coatings on the basis of transition metal nitrides have high hardness and good adhesion to the substrate [1][2][3][4]. Upon the transition of nitride coatings to the nanostructured state there is a significant improvement in their physicomechanical and tribological properties [5], an increase in resistance to thermal impacts [6][7][8][9], improvement of corrosion resistance [10][11][12][13][14], etc.…”

Section: Introductionmentioning

confidence: 99%

Influence of the bilayer thickness of nanostructured multilayer MoN/CrN coating on its microstructure, hardness, and elemental composition

et al. 2017

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Abstract-Multilayer nanostructured coatings consisting of alternating MoN and CrN layers were obtained by vacuum cathode evaporation under various conditions of deposition. The transition from micron sizes of bilayers to the nanometer scale in the coatings under investigation leads to an increase in hardness from 15 to 35.5 GPa (with a layer thickness of about 35 nm). At the same time, when the number of bilayers in the coating decreases, the average Vickers hardness increases from 1267 HV 0.05 to 3307 HV 0.05 . An increase in the value of the potential supplied to the substrate from -20 to -150 V leads to the formation of growth textures in coating layers with the [100] axis, and to an increase in the intensity of reflections with increasing bilayer thickness. Elemental analysis carried out with the help of Rutherford backscattering, secondary ion mass spectrometry and energy dispersion spectra showed a good separation of the MoN and CrN layers near the surface of the coatings.

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“…Вакуумно-дуговые покрытия на основе нитридов пере-ходных металлов обладают высокой твердостью и хоро-шей адгезией к подложке [1][2][3][4]. При переходе нитридных покрытий в наноструктурное состояние [5] отмечается существенное улучшение их физико-механических и три-бологических свойств, повышение стойкости к темпе-ратурным воздействиям [6][7][8][9], улучшение коррозионной стойкости [10][11][12][13][14] и т. д. Одним из способов реализации перехода покрытий в наноструктурное состояние явля-ется осаждение многослойных композиционных матери-алов [15][16][17], в которых чередование слоев из разных составляющих [14,18] служит хорошим диффузионным барьером [19] и обеспечивает повышение стабильности свойств при внешних воздействиях [20].…”

Section: Introductionunclassified

Влияние толщины бислоя наноструктурного многослойного покрытия MoN/CrN на его микроструктуру, твердость и элементный состав

Погребняк¹,

Бондар

Жоллыбеков³

et al. 2017

Физика Твердого Тела

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Многослойные наноструктурные покрытия, состоящие из чередующихся слоев MoN и CrN, получены методом вакуумно-дугового испарения катода при различных условиях осаждения. Переход от микронных размеров бислоев к нанометровому масштабу в исследуемых покрытиях приводит к росту нанотвердости от 15 до 35.5 GPa (при толщине слоя порядка 35 nm). В то же время с уменьшением количества бислоев в покрытии среднее значение твердости по Виккерсу увеличивается от 1267 HV 0.05 до 3307 HV 0.05 . Повышение величины подаваемого на подложку потенциала от −20 до −150 V приводит к формированию в слоях покрытий текстуры роста с осью [100], а также к увеличению интенсивности рефлексов с ростом толщины бислоев. Элементный анализ, проведенный с помощью резерфордовского обратного рассеяния, вторичной ионной масс-спектрометрии и энергодисперсионных спектров, показал хорошее разделение слоев MoN и CrN вблизи поверхности покрытий.Работа выполнена в рамках бюджетных тематик № 0115U000682 " Разработка материаловедческих основ структурной инженерии вакуумно-плазменных сверхтвердых покрытий с целью достижения необходимых функциональных свойств" и № 0116U006816 " Разработка перспективных наноструктурных многослойных покрытий с улучшенными физико-механическими и трибологическими свойствами".

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Structure and hardness of vacuum arc deposited multi-component nitride coatings of Ti, Zr and Nb

Cited by 72 publications

References 19 publications

Structural and mechanical properties of NbN and Nb-Si-N films: Experiment and molecular dynamics simulations

Structural and mechanical properties of NbN and Nb-Si-N films: Experiment and molecular dynamics simulations

Influence of the bilayer thickness of nanostructured multilayer MoN/CrN coating on its microstructure, hardness, and elemental composition

Влияние толщины бислоя наноструктурного многослойного покрытия MoN/CrN на его микроструктуру, твердость и элементный состав

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