“…[5][6][7][8] Other noteworthy applications include Mott-Hubbard insulators and buffer layers for the deposition of other oriented films, such as superconducting films with well-matched lattice parameters, since NiO crystallizes in the cubic rock-salt structure with a lattice parameter of 4.17 Å . [9,10] NiO thin films have been grown by various deposition techniques, such as pulsed-laser deposition, [11] electronbeam and thermal evaporation, [12,13] reactive sputtering, [14] sol-gel deposition, [15] spray pyrolysis, [1,16] high-temperature oxidation, [17] chemical bath deposition, [3,18] and CVD. [19][20][21] In recent years, ALD has gained acceptance as a key technology for advanced thin film deposition in microelectronic applications.…”