2006
DOI: 10.1063/1.2404597
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Structure and photoluminescence properties of epitaxially oriented GaN nanorods grown on Si(111) by plasma-assisted molecular-beam epitaxy

Abstract: The authors show that vertically c-axis-aligned GaN nanorod arrays grown by plasma-assisted molecular-beam epitaxy are epitaxially oriented on Si͑111͒ substrates and their crystal structure corresponds to a fully relaxed wurtzite lattice. At later growth stage, these GaN nanorods exhibit the tendency to coalesce into nanorod bundles. Low-temperature photoluminescence spectrum from 1-m-long GaN nanorods consists of intense exciton lines of strain-free bulk GaN and additional lines at ϳ3.21 and ϳ3.42 eV ͑Y 7 and… Show more

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Cited by 93 publications
(59 citation statements)
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“…Indeed, it should be noticed that the spectral interval where the narrow peaks appear in the present samples overlaps with the DAP band in WZ and ZB GaN (E $ 3.0-3.3 eV), 10,25,26 which has also been reported in nanowires. 18,[27][28][29] However, the attribution of the narrow peaks in the 3.1 eV-3.42 eV range to DAP seems to be inappropriate in the present case. The DAP emission is indeed characterized by a very different spectral shape in GaN thin film and nanowire samples, 18,25,26,28,29 where the two dominant emissions are at 3.21 eV and 3.27 eV and are significantly broader than the features found in the present samples.…”
Section: Discussionmentioning
confidence: 56%
“…Indeed, it should be noticed that the spectral interval where the narrow peaks appear in the present samples overlaps with the DAP band in WZ and ZB GaN (E $ 3.0-3.3 eV), 10,25,26 which has also been reported in nanowires. 18,[27][28][29] However, the attribution of the narrow peaks in the 3.1 eV-3.42 eV range to DAP seems to be inappropriate in the present case. The DAP emission is indeed characterized by a very different spectral shape in GaN thin film and nanowire samples, 18,25,26,28,29 where the two dominant emissions are at 3.21 eV and 3.27 eV and are significantly broader than the features found in the present samples.…”
Section: Discussionmentioning
confidence: 56%
“…These techniques are time consuming and might degrade the quality of the structures. Thus, a self-organized or in situ structuring process would be preferable and was presented to take place on Si(111) substrates [10][11][12]. In this paper we report on GaN nanorods grown by plasma assisted molecular beam epitaxy (PAMBE) on nitridated r-plane sapphire substrates.…”
mentioning
confidence: 97%
“…NRs by plasma-assisted molecular beam epitaxy ͑PAMBE͒ has been reported on different substrate materials, including Si ͑111͒, Si ͑001͒, or sapphire, 4,5 as well as on GaN or AlN wetting layers. [6][7][8] Ni nanoparticles have been used as catalysts and the growth of homogeneous NRs has been demonstrated and could be explained based on the vapor-liquidsolid ͑VLS͒ growth model.…”
Section: Introductionmentioning
confidence: 99%