We have observed the existence of medium-range order in amorphous silicon with the fluctuation electron microscopy technique. We hypothesize that this structure is produced during the highly nonequilibrium deposition process, during which nuclei are formed and subsequently buried. We test this hypothesis by altering the deposition kinetics during magnetron sputter deposition by bombarding the growth surface with a variable flux of low-energy ͑20 eV͒ Ar ϩ ions. We observe that medium-range order increases monotonically as the ion/neutral flux ratio increases. We suggest that this low-energy bombardment increases adspecie surface mobility or modifies local structural rearrangements, resulting in enhanced medium-range order via increases in the size, volume fraction, and/or internal order of the nuclei. 1 has revealed that a-Si is not a completely disordered covalent random network, as was historically thought. With the FEM technique, a-Si was found to contain significant medium-range order ͑MRO͒ on the length scale of 1-2 nm. MRO at such a scale is virtually impossible to detect with standard diffraction measurements, as these are only sensitive to two-body correlation functions. However, MRO is clearly visible in FEM, which is sensitive to the three-and four-body correlation functions.
1In FEM the statistical variance, V, of dark-field hollowcone transmission electron microscopy ͑TEM͒ images taken at a MRO-scale ͑1.5 nm͒ microscope resolution is measured as a function of the diffraction vector magnitude k. All simulations performed to date 2,3 indicate that V(k) and MRO are monotonically related and that a fine-grained, highly strained structure termed ''paracrystalline'' provides the best match to FEM data, whereas continuous random networks fail to do so. 4 We hypothesize that the paracrystalline structure is produced during growth of a-Si via a frustrated polycrystalline growth surface: at low substrate temperatures (T sub ), crystalline nuclei are produced on the growth surface but are quickly buried by subsequent nucleation events. In the bulk these crystallites are forced into a strained, metastable state as the surface energy of the crystallites is different in the bulk than on the film surface. This strain, produced by grain boundary bonding constraints, shifts the atoms slightly out of crystalline register, but order at the medium-range remains. Larger or more ordered paracrystallites should therefore demonstrate greater MRO. When larger nuclei were produced via increased substrate temperatures during growth of a-Si, the MRO strongly increased.
5Initial simulations performed to probe the effect of paracrystallite sizes on FEM also demonstrated changes in the vibrational and electronic densities of states.2,3 Therefore, in addition to FEM, we probe the the vibrational and electronic densities of states via Raman scattering and spectroscopic ellipsometry ͑SE͒.In this work, we investigated the role that surface growth mechanisms play in producing MRO by keeping T sub strictly constant (230°C) and bombarding...