Structure and properties of Ag embedded aluminum doped ZnO nanocomposite thin films prepared through a sol–gel process

Heterogeneous photocatalytic degradation of 4-nitrophenol in aqueous suspension by Ln (La3+, Nd3+ or Sm3+) doped ZnO nanoparticles

“…4). Such changes in crystallinity might be the result of changes in the atomic environment due to impurity doping on ZnO samples [34] The ionic radii of La, Nd, Sm and Zn are r(La 3+ ) = 0.122 nm, r(Nd 3+ ) = 0.110 nm, r(Sm 3+ ) = 0.096 nm, and r(Zn 2+ ) = 0.074 nm, respectively.…”

Effects of substrate temperature on properties of the aluminum-doped zinc oxide thin films deposited by RF magnetron sputtering

“…AZO is a potential alternative to indium tin oxide (ITO) in all corresponding applications such as plasma displays, liquid crystal displays, transparent electrodes for solar cells [1,3]. Al-doped ZnO (ZnO:Al) thin films (ZAO) have attracted much attention as an important transparent conductive oxide (TCO) thin film material.…”

Structure and morphology of nanostructured zinc oxide thin films Prepared by dip-vs. spin-coating methods

“…ZnO thin films are important materials [6], due to their wide applicability in photoluminescence, transparent semiconductors [7], photocatalysts, piezoelectricity [8], gas sensors [9] UV light emitting devices [10,11], varistors [12] and optical devices [13]. There are various methods for preparing ZnO thin films including physical vapor deposition [14], chemical vapor deposition (CVD) [15], spray pyrolysis, sputtering [16,17] and pulsed laser deposition (PLD) [18], as well as the ink-jet printing [19], basic erosion [20] and sol-gel methods [21][22][23][24][25][26][27][28]. The important advantages of sol-gel processing, for the purpose of conventional thin film deposition, are chemical composition control, low-temperature annealing and homogeneity of the sol solution.…”