Structure and properties of Al2O3 thin films deposited by ALD process

Boryło, Paulina; Lukaszkowicz, K.; Szindler, M.; Kubacki, Jerzy; Balin, Katarzyna; Basiaga, Marcin; Szewczenko, Janusz

doi:10.1016/j.vacuum.2016.07.013

Cited by 62 publications

(51 citation statements)

References 23 publications

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“…The deposition temperature with this method can be achieved at temperatures from room temperature to 500 °C. High-resolution TEM (HRTEM) images and polarisation tests showed that the best quality films in terms of density and purity are obtained when prepared under higher temperatures of 300 °C, as shown in Figure 13a–c, respectively [83]. Alumina nanocoating over 316L stainless steel showed a better corrosion performance for coating prepared with ALD at 250 °C compared to the same materials prepared at 160 °C.…”

Section: Nanocoating and Its Role In Corrosion Preventionmentioning

confidence: 99%

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A Review on the Corrosion Behaviour of Nanocoatings on Metallic Substrates

et al. 2019

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Growth in nanocoatings technology is moving towards implementing nanocoatings in many sectors of the industry due to their excellent abilities. Nanocoatings offer numerous advantages, including surface hardness, adhesive strength, long-term and/or high-temperature corrosion resistance, the enhancement of tribological properties, etc. In addition, nanocoatings can be applied in thinner and smoother thickness, which allows flexibility in equipment design, improved efficiency, lower fuel economy, lower carbon footprints, and lower maintenance and operating costs. Nanocoatings are utilised efficiently to reduce the effect of a corrosive environment. A nanocoating is a coating that either has constituents in the nanoscale, or is composed of layers that are less than 100 nm. The fine sizes of nanomaterials and the high density of their ground boundaries enable good adhesion and an excellent physical coverage of the coated surface. Yet, such fine properties might form active sites for corrosion attack. This paper reviews the corrosion behaviour of metallic, ceramic, and nanocomposite coatings on the surface of metallic substrates. It summarises the factors affecting the corrosion of these substrates, as well as the conditions where such coatings provided required protection.

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Section: Nanocoating and Its Role In Corrosion Preventionmentioning

confidence: 99%

“…( a , b ) High-resolution (HRTEM) micrograph of the Al 2 O 3 layer deposited at 300 °C with corresponding SAED pattern; ( c ) Potentiodynamic polarisation curves of the Al 2 O 3 coating of different deposition temperatures tested in 1-M HCl solution [83]. …”

Section: Figurementioning

confidence: 99%

A Review on the Corrosion Behaviour of Nanocoatings on Metallic Substrates

et al. 2019

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“…In the frame of microtechnologies, aluminium oxide (Al2O3) has been investigated for several applications: as a "high-k" material for MOS gate oxide [1,2], as an ion-sensitive and passivation layer for FET-based microsensors [3,4], as a passivation layer for OLED and solar cell devices [5,6], as a luminescent material for dosimeters [7],... As a consequence, many processes based on physical and/or chemical deposition techniques were developed in order to integrate alumina thin films with optimized properties into the corresponding fabrication processes: electron beam evaporation [8,9], pulsed laser deposition [10], sputtering [11], chemical vapour deposition [12], metal-organic chemical vapour deposition [13], plasma-enhanced chemical vapour deposition [14],... Among them, atomic layer deposition (ALD) was thoroughly studied for the conformal deposition of Al2O3 thin films [15][16][17], emphasizing the use of tri-methyl-aluminium Al(CH3)3 (also called TMA) as an aluminium source and water (H2O) as an oxidant source [18][19][20][21][22][23][24][25]. Nevertheless, other sources such aluminium trichloride (AlCl3) as well as dioxygen (O2) and ozone (O3), were also developed in parallel using plasma-enhanced atomic layer deposition (PE-ALD) in order to reduce the impurity content in the grown Al2O3 film and improve their dielectric properties [24][25][26][27][28].…”

Section: Introductionmentioning

confidence: 99%

“…In the different studies related to the ALD process [18][19][20][21][22][23][24][25][26][27][28], the presence of a steep interface was systematically assumed between the Al2O3 films and the silicon substrate, which allows simplifying the determination of the ALD growth rate per cycle as well as defining different growth types: linear, substrate-enhanced and substrate-inhibited [29]. This "steep interface" assumption seems obvious when considering the atomic layer deposition principles.…”

Section: Introductionmentioning

confidence: 99%

Study of aluminium oxide thin films deposited by plasma-enhanced atomic layer deposition from tri-methyl-aluminium and dioxygen precursors: Investigation of interfacial and structural properties

et al. 2018

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HAL is a multidisciplinary open access archive for the deposit and dissemination of scientific research documents, whether they are published or not. The documents may come from teaching and research institutions in France or abroad, or from public or private research centers. L'archive ouverte pluridisciplinaire HAL, est destinée au dépôt et à la diffusion de documents scientifiques de niveau recherche, publiés ou non, émanant des établissements d'enseignement et de recherche français ou étrangers, des laboratoires publics ou privés.

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“…For Ga3d spectrum, there are two peaks located at 19.9 eV and 18.1 eV, the former Ga3d 5/2 peak ascribed to GaN [24], the latter Ga3d 5/2 peak ascribes to metal Ga [25]. O1s spectrum has 534.8 eV and 531.7 eV, which ascribe O1s to adsorbed O 2 and Al 2 O 3 , respectively [26,27]. Al 2p spectrum has a peak at 73.9 eV related to Al2p 3/2 in Al 2 O 3 [28][29][30].…”

Section: Surface Characterizationmentioning

confidence: 99%

Microstructure and corrosion behaviors of AZ31 alloy with an amorphous-crystallin nano-composite film

Liu

et al. 2020

Mater. Res. Express

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Magnesium (Mg) alloy has drawn considerable attention for lightweight structural and functional materials, whereas its corrosion resistance still requires to be enhanced. A new strategy for corrosion resistance has been proposed as making an amorphous-crystalline nano-composite film on Mg alloys. The film as the composition as Al 2 O 3 /GaN with a thickness of 20 nm was prepared on AZ31 Mg alloy by atomic layer deposition. Grazing incidence x-ray diffraction, scanning electron microscopy equipped with energy-dispersive spectroscopy, transmission electron microscopy, x-ray photoelectron spectroscopy, and nano indentation tester have been used to characterize the film in details. It is verified the sample has an amorphous/crystalline/Mg interface structure, and a surface with homogeneous elemental distribution and higher hardness. Neutral salt spray test shows the film changes the corroded mode from pitting corrosion to uniform corrosion. Furthermore, electrochemical measurements indicate that the film would raise E corr (ΔE corr =+0.295 V), drop i corr (about 1/10 times), and make electrical equivalent circuits change from R s (CPE R ct (R L L)) to R s (CR f ) (CPE R ct (R L L)). All evaluations show that better corrosion resistance has been by inducing the amorphouscrystalline nano film. The amorphous layer in the film would make a more homogeneous Cl − distribution in the surface and act as a barrier to block the penetration of corrosion medium in the early stage. During corrosion, the interface between the layers in the film could retard the corrosion crack propagating further. The film would be favorate to form a denser corrosion product layer finally. A more uniform and lower corrosion occurs for AZ31 Mg alloy with this nano-composite film.

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Structure and properties of Al2O3 thin films deposited by ALD process

Cited by 62 publications

References 23 publications

A Review on the Corrosion Behaviour of Nanocoatings on Metallic Substrates

A Review on the Corrosion Behaviour of Nanocoatings on Metallic Substrates

Study of aluminium oxide thin films deposited by plasma-enhanced atomic layer deposition from tri-methyl-aluminium and dioxygen precursors: Investigation of interfacial and structural properties

Microstructure and corrosion behaviors of AZ31 alloy with an amorphous-crystallin nano-composite film

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