Structure and Property of CrAlN Coatings Prepared by Bipolar Pulsed Dual Magnetron Sputtering (BPDMS) under Different Pulse Bias Voltage

Abstract

Recently, Cr-Al-N coatings have received more and more attention of researchers owing to its standing-out mechanical performances and superior chemical stability. In this present work, CrAlN ternary coatings were deposited by a bipolar pulsed dual magnetron sputtering (BPDMS) method and the effects of substrate negative bias on deposition rate, structure, hardness and adhesion of the coatings were investigated. The application of appropriate negative substrate bias voltage leads to dense structure, high hardness and excellent adhesion for CrAlN coatings.

Structure and Mechanical Properties of (CrAl)N and (CrAlSiY)N Coatings Prepared by Asymmetrical Bipolar DC Magnetron Sputtering

“…But it is difficult to produce CrAl alloy target with a high Al ratio owing to the formation of brittle intermetallic compound phases (IMCs) [10]. An alternative method is to use separate elemental Cr and Al sources to and adjust sputtering power of the two targets individually [11]. In this case bipolar pulse DC magnetron sputtering (BPDMS) is the ideal technique for deposition of CrAlN in order to avoid "anode disappearing" and "arcing" phenomenon owing to the formation of insulating AlN on the surface of the Al target and the deposition of AlN on the inner surface of the deposition chamber [11].…”