Flexible sensors and photodetectors
are among the robust and powerful
strategies for advanced and smart devices. Meanwhile, wide band-gap
metal oxides are competitive candidates for fabricating flexible solar-blind
photodetectors (SBPDs) but still challenging in both fundamental and
practical fields. Here, we demonstrate the amorphous ALD-Ga2O3 (am-ALD-Ga2O3) thin films realized
at a moderate temperature toward flexible SBPDs. The bandgap (E
g) of 4.88–5.04 eV depends on and changes
with the thickness of am-ALD-Ga2O3 thin films
during atomic layer deposition (ALD) processes. The SBPDs are fabricated
with the as-grown am-ALD-Ga2O3 thin films on
desired substrates and exhibit an I
light
/I
dark ratio of up to ∼4.5 ×
104 and dark current down to ∼10–13 A. Subsequently, decorating the ALD-Ga2O3 channels
with MoS2 multilayers helps improve the photocurrent of
SBPDs that worked in the deep ultraviolet region. We expect that our
work will offer more opportunities to understand and exploit am-ALD-Ga2O3 thin films toward advanced flexible SBPDs and
functional sensors.