Structure formation upon reactive direct current magnetron sputteringof transition metal oxide films

Abstract

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Influence of ionisation zone motion in high power impulse magnetron sputtering on angular ion flux and NbOxfilm growth

“…Ngaruiya et al reported the formation of amorphous NbO x films in deposition by dcMS without external heating and grounded substrates [57]. Apparently, the additional energy input from the high degree of ionisation in the HiPIMS discharge applied within this work to grow the NbO x films is still insufficient to trigger the growth of a crystalline NbO x phase.…”

Determination of Optical Properties of Thin Films from Ketteler-Helmholtz Dispersion Relations: Application to the Case of Ultraviolet Irradiated Zirconium Oxide

“…Sputtering deposition is a widely used technique which offers several advantages over other methods: high deposition rates; dense defect-free oxide films; not requiring high temperature; the fact that films have a composition close to that of the source material; the fact that high melting point materials are easily sputtered; sputtering usually leading to less contamination than evaporation methods; the fact that sputtered films have a good adhesion on the substrate; the fact that it can also be performed top-down. Due to its ability to reduce arcing during the reactive process, pulsed direct current magnetron sputtering is a valuable version of the sputtering technique [30][31][32][33][34][35][36][37][38][39][40][41][42][43][44].…”

Diffusion of oxygen in amorphous Al2O3, Ta2O5, and Nb2O5

“…There is growing interest in amorphous oxides for use as functional materials in a wide range of applications in the field of electrical, optical, chemical, and environmental engineering. For example, amorphous Al 2 O 3 (a-Al 2 O 3 ), a-Ta 2 O 5 , and a-Nb 2 O 5 are considered good coating materials for electrical, [1][2][3][4] biomedical, 5 and optical devices [6][7][8] because of their excellent dielectric, corrosion resistance, and reflective properties, respectively. For practical uses, the thermal stability of the layer is an important factor.…”