2005
DOI: 10.1016/j.jallcom.2005.03.065
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Structure modelling and reciprocal space maps simulation of the (Ga,Al)N epitaxial layers deposited on the sapphire substrate

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Cited by 2 publications
(2 citation statements)
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“…GaN layers deposited on heteroepitaxy processes mostly on sapphire substrates have extended shape of their RLP . This is due to the lattice mismatch between the substrate and the layers and therefore due to columnar structure of the GaN layer . In figure , RLMs of symmetrical planes of various substrates are shown.…”
Section: Structural Studiesmentioning
confidence: 99%
“…GaN layers deposited on heteroepitaxy processes mostly on sapphire substrates have extended shape of their RLP . This is due to the lattice mismatch between the substrate and the layers and therefore due to columnar structure of the GaN layer . In figure , RLMs of symmetrical planes of various substrates are shown.…”
Section: Structural Studiesmentioning
confidence: 99%
“…Characterization process of such structures, possesses many problems and the appointment of the value of these undesirable attributes in some cases is difficult. Various methods of characterization of such structures can be carried out in different ways [5][6][7][8][9][10][11][12][13][14][15], e.g. by measuring a number of diffraction reflections [5][6][7], by analyzing the shape of the diffraction reflections or reciprocal lattice points (RLP) [8][9][10][11][12].…”
Section: Introductionmentioning
confidence: 99%