2017
DOI: 10.1016/j.nimb.2017.04.070
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Structure of Cu–N layers synthesized by pulsed magnetron sputtering with variable frequency of plasma generation

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Cited by 10 publications
(6 citation statements)
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“…The change in the thermal conditions, along with the conditions of the plasma generation, caused the columnar growth. A similar effect was observed during the synthesis of Cu-N layers, when the power was increased [35]. It was observed that electrical conditions of the plasma generation caused differences in the thickness of the coatings.…”
Section: Eds Resultssupporting
confidence: 67%
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“…The change in the thermal conditions, along with the conditions of the plasma generation, caused the columnar growth. A similar effect was observed during the synthesis of Cu-N layers, when the power was increased [35]. It was observed that electrical conditions of the plasma generation caused differences in the thickness of the coatings.…”
Section: Eds Resultssupporting
confidence: 67%
“…As observed previously [31][32][33][34][35], the pulsed processes on ambient temperature substrates create metastable states from plasma sputtered particles due to rapid heat loss, which effectively freezes atoms and particles on the substrate. The interaction of pulsed plasma with the surface creates an instantaneous and highly energetic thermal effect, which allows heat activation (for adhesion) and a limited short-range diffusion.…”
Section: Xrd Resultsmentioning
confidence: 61%
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“…The Tauc plot for the examined films is presented in Figure 10 c. The estimated value of E g is 2.60 ± 0.04 eV (477 ± 7 nm) and 2.00 ± 0.01 eV (620 ± 3 nm) for CuO and Cu 3 N, respectively. The band-gap energy determined for Cu 3 N is comparable to [ 50 , 62 ] or larger [ 61 , 63 ] than the experimental results or theoretical calculations [ 21 , 64 ]. The literature value of the band-gap energy for CuO is in the range off 1.2 to 2.8 eV [ 65 , 66 , 67 , 68 , 69 , 70 , 71 , 72 , 73 ], however, the value obtained in this work is comparable to the values obtained for CuO nanoparticles [ 65 , 66 , 67 , 68 , 69 , 70 , 71 , 72 , 73 , 74 ].…”
Section: Resultsmentioning
confidence: 55%