The high density and controllability of radio frequency (RF)-biased inductively coupled plasma offer significant potential for diamond-like carbon (DLC) deposition on alumina. However, the effects of power and atmospheric parameters on DLC deposition have been understudied due to multiple constraints, such as discharge conditions and carbon source requirements. In this study, considering the dual requirements of ion flux and ion kinetic energy for deposition, an RF-biased inductively coupled plasma-enhanced DLC deposition method was proposed. A total of 273 deposition experiments designed by response surface methodology were performed over wide parameter ranges to explore the influence of atmospheric parameters, such as gas pressure and Ar/H2 auxiliary gas fractions, on feasible power. The results showed that there was a power threshold for DLC deposition on alumina, which increased with gas pressure and slightly decreased with auxiliary gas addition. The effect of auxiliary gas on DLC deposition exhibited duality due to changes in the dominance of ion etching and methane dissociation. The feasible power region for DLC deposition in multicomponent atmosphere was jointly constrained by the power threshold and etching action. This research contributed to the DLC modification of alumina substrate in batches.