Structure of superhard nanocrystalline (Ti,Al)N layers deposited by reactive pulsed magnetron sputtering

Zywitzki, O.; Klostermann, Heidrun; Fietzke, Fred; Modes, T.

doi:10.1016/j.surfcoat.2005.11.018

Cited by 15 publications

(9 citation statements)

References 21 publications

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“…For a better comparison with CVD-Ti 1 − x Al x N, the Young's modulus of typical PVD layers was measured with the same technique [2]. For optimal measurement conditions all nanoindentation investigations of the LPCVD coatings were not conducted on the surface but in calotte sections of Ti 1 − x Al x N layers having a thickness between 7 µm and 10 µm.…”

Section: Microhardness and Youngts Modulusmentioning

confidence: 99%

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Novel aluminum-rich Ti1−xAlxN coatings by LPCVD

Endler

Höhn

Herrmann

et al. 2008

Surface and Coatings Technology

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Section: Microhardness and Youngts Modulusmentioning

confidence: 99%

“…Ti 1 − x Al x N with the NaCl structure is a metastable material. It was prepared by low temperature methods as reactive PVD [1,2], PECVD [3][4][5] or MOCVD [6]. Conventional thermal CVD does not allow the synthesis of fcc-Ti 1 − x Al x N because a reaction temperature higher than 1100 K is necessary [7].…”

Section: Introductionmentioning

confidence: 99%

Novel aluminum-rich Ti1−xAlxN coatings by LPCVD

Endler

Höhn

Herrmann

et al. 2008

Surface and Coatings Technology

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“…The microstructure of TiAlN nanocoating is composed of columnar crystallite [2]. The columns are separated by porosity on the grain boundary.…”

Section: Discussionmentioning

confidence: 99%

“…The crystal structure of TiAlN nanocoating mainly consists of (111) and (200) TiAlN peak and strongly influenced by deposition parameters such as nitrogen flow rate or pressure and substrate bias [2][3][4]. The evolution of crystal structure of TiAlN nanocoating influences the nanocoating morphology.…”

Section: Introductionmentioning

confidence: 99%

Effect of Reactive Sputtering Parameters on TiAlN Nanocoating Structure and Morphology

Budi¹,

Razali²,

Nizam³

et al. 2010

AIP Conference Proceedings

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Interdependence between stress, preferred orientation, and surface morphology of nanocrystalline TiN thin films deposited by dual ion beam sputtering Abstract. The effect of substrate bias and nitrogen flow rate on the TiAlN nanocoating structure and morphology has been investigated by using reactive unbalance DC magnetron sputtering. TiAlN nanocoating was deposited on the tungsten carbide insert tool and the structure and morphology were characterized by using XRD and AFM, respectively. The substrate bias was varied between 0 to -221 V and the nitrogen flow rate was varied between 30 to 72 sccm. The results showed that the structure of TiAlN nanocoating consisted of mainly (111) and (200) plane. The structure was significatly influenced by substrate bias in promoting finer crystal size and increased crystal plane spacing while the rms roughness of nanocoating was influenced by substrate bias and nitrogen flow rate.

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“…Different TiAlN coatings have been reported and been synthesized by various deposition techniques including cathodic arc ion plating [1][2][3], ion beam sputter plating [4], ion mixing and vapor deposition [5], and reactive magnetron sputtering [6][7][8][9][10]. In general, physical vapor deposition (PVD) is the main method to deposit TiAlN coatings.…”

Section: Introductionmentioning

confidence: 99%