2004
DOI: 10.1002/app.20350
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Structure–property relationship and influences of phenolic compounds on the mechanical and thermomechanical properties of UV‐cured acrylic resin networks

Abstract: Trimethylolpropane triacrylate (TMPTA) resin was cured under UV radiation, with 2,2-dimethoxy-2-phenylacetophenon (DMPA) and a mixture of benzophenone and methyl-diethanolamine (BP/MDEA) as initiators and three phenolic compounds as inhibitors, respectively. For each formulation, the curing enthalpy was measured by photocalorimetry and the modulus of elasticity (MOE) of cured resin films by thermomechanical analysis. The DMPA resulted in networks with higher rigidity that was slightly reduced by the addition o… Show more

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Cited by 8 publications
(1 citation statement)
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“…Indeed, the photochemical reactivity of some wood components with radical species retards and inhibits the initiation phase of the curing process 10,11 and also has an influence on the degree of cure and the mechanical properties of the finish film. 12 Furthermore, the addition of UV absorbers into such photocurable systems is difficult because these compounds may interact with photoinitiators and retard the polymerization process since the spectral windows of both types of substances are largely superimposed. To overcome this difficulty, some researchers proposed to implement photoinitiators working under visible light.…”
Section: Introductionmentioning
confidence: 99%
“…Indeed, the photochemical reactivity of some wood components with radical species retards and inhibits the initiation phase of the curing process 10,11 and also has an influence on the degree of cure and the mechanical properties of the finish film. 12 Furthermore, the addition of UV absorbers into such photocurable systems is difficult because these compounds may interact with photoinitiators and retard the polymerization process since the spectral windows of both types of substances are largely superimposed. To overcome this difficulty, some researchers proposed to implement photoinitiators working under visible light.…”
Section: Introductionmentioning
confidence: 99%