2011
DOI: 10.1016/j.tsf.2011.03.091
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Structures and magnetic properties of Co and CoFe films prepared by magnetron sputtering

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Cited by 19 publications
(15 citation statements)
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“…The surface roughness shows a minimum at 20 nm. This tendency is also observed by Lin et al [7] for Co 40 Fe 60 obtained by RF magnetron sputtering.…”
Section: A Microanalysissupporting
confidence: 82%
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“…The surface roughness shows a minimum at 20 nm. This tendency is also observed by Lin et al [7] for Co 40 Fe 60 obtained by RF magnetron sputtering.…”
Section: A Microanalysissupporting
confidence: 82%
“…Our results are slightly better than those found in Ref. [7] Co but the precision on Co content (targeted to be 65%) was poor due to the existence of an anomalous codeposition during the electrodeposition process [1]. The low value of H c and high magnetization at saturation, together with high magnetization at remanence is very interesting in the view of developing sensors active layers or for highfrequency applications [26].…”
Section: E Magnetic Behaviorcontrasting
confidence: 55%
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“…The recording regions on MO disk are made by the MO data storage system before MFM scanning. Deposition of the Co films on Si(100) substrates was performed by a radio‐frequency magnetron sputtering process, which has already been described in detail elsewhere (Hsu et al, ; Jiao et al, ; Lin et al, ). The Co (99.99% purity) target was pre‐sputtered for 10 min when the base pressure was less than 3 × 10 −8 Torr using argon (99.9995% purity) as the sputtering gas.…”
Section: Methodsmentioning
confidence: 99%
“…Aunque existe un buen número de trabajos experimentales [4], no se han realizado muchos estudios teóricos de modelamiento y simulación que permitan comprender la fenomenología que gobierna el comportamiento de estos materiales. Una de las técnicas más empleadas para hacer este tipo de simulaciones es el método de Monte Carlo.…”
Section: Introductionunclassified