2014
DOI: 10.1016/j.physleta.2014.03.041
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Studies of relativistic electron scattering at planar alignment in a thin Si crystal

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Cited by 17 publications
(8 citation statements)
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“…As a continuation of recent experiments on 255 MeV electrons channeling and scattering in a thin aligned Si crystal [4,9], new experiments on channeling of 255 MeV electrons in a HWC were performed at SAGA LS facilities. The simulations of trajectories for (2 2 0) and (1 1 1) planar channeling in Si were performed using the computer code BCM-1.0 [7], which was modified to take into account both the initial spatial and angular divergences of the electron beam.…”
Section: Discussionmentioning
confidence: 99%
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“…As a continuation of recent experiments on 255 MeV electrons channeling and scattering in a thin aligned Si crystal [4,9], new experiments on channeling of 255 MeV electrons in a HWC were performed at SAGA LS facilities. The simulations of trajectories for (2 2 0) and (1 1 1) planar channeling in Si were performed using the computer code BCM-1.0 [7], which was modified to take into account both the initial spatial and angular divergences of the electron beam.…”
Section: Discussionmentioning
confidence: 99%
“…To perform the data analysis, a 2-dimensional beam profile was projected onto the vertical and horizontal directions and obtained 1D profiles like in Ref. [4]. …”
Section: Planar Channeling Experiments In Si Hwcmentioning
confidence: 99%
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“…The electron beam energy was 255 MeV (corresponding to a Lorentz factor  of 500). The details are described in [13]. The repetition rate of the beam acceleration was 1 Hz, and the average beam current was 7 nA.…”
Section: Channelling Experiments In Hwc Simentioning
confidence: 99%
“…This problem still is subjected to a serious study [16]. The possibility of stochastic deflection of negatively charged high-energy particles (which means deflection in the result of chaotic scattering of particles on bent crystal atomic strings) was proposed in [17,18] and experimentally demonstrated in [19].…”
Section: Introductionmentioning
confidence: 99%