“…Most often, PbS thin films have been deposited by various chemical techniques, including Chemical Bath Deposition (CBD) [ 14 ], Successive Ionic Layer Adsorption and Reaction (SILAR) [ 15 ], electrodeposition [ 16 ], and spray pyrolysis method [ 17 ]. The popularity of chemical deposition techniques is due to their low cost and ease of implementation even if the final quality of the PbS films is not always optimal and the optoelectronic performance of their associated devices is poor [ 18 , 19 ]. On the other hand, physical vapor deposition (PVD) techniques (including sputtering [ 20 , 21 ], thermal evaporation [ 22 ], atomic layer deposition [ 23 ], or pulsed laser deposition (PLD) [ 24 , 25 , 26 ]) have been used to deposit PbS thin films onto different substrates.…”