2010
DOI: 10.1016/j.jhazmat.2009.08.095
|View full text |Cite
|
Sign up to set email alerts
|

Studies on destruction of silicon tetrachloride using microwave plasma jet

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
3
1
1

Citation Types

0
6
0

Year Published

2010
2010
2024
2024

Publication Types

Select...
7
1
1

Relationship

0
9

Authors

Journals

citations
Cited by 12 publications
(6 citation statements)
references
References 22 publications
0
6
0
Order By: Relevance
“…They are mainly excited at 2.45 GHz by surface guided waves [81,[83][84][85][86][87][88] or by TIA-like structures [105][106][107] following the original idea of the Torche à Injection Axiale (TIA)…”
Section: Plasma Torchesmentioning
confidence: 99%
“…They are mainly excited at 2.45 GHz by surface guided waves [81,[83][84][85][86][87][88] or by TIA-like structures [105][106][107] following the original idea of the Torche à Injection Axiale (TIA)…”
Section: Plasma Torchesmentioning
confidence: 99%
“…The rapid expansion of particles mitigates growth, and particles undergoing a rapid cooling process enable condensed particles to be attached to substrates producing nanosilicon in the form of powder. Si product was produced from SiCl 4 with a particle grain size of 54 nm under microwave plasma jet and hydrogen as reactive gas [69]. Nanosilicon produced from organic precursors had a large specific surface with an average surface size of around 28 nm and an amorphous form [70].…”
Section: Production Of Nanostructured Siliconmentioning
confidence: 99%
“…Many technologies have been developed for the removal and recycling of these byproducts. For example, microwave plasma jets can destroy silicon tetrachloride [3] . Due to their strong reaction activity, trichlorosilane and silicon tetrachloride can be introduced to synthesize some new functional materials [4] .…”
Section: Introductionmentioning
confidence: 99%