1996
DOI: 10.1016/0300-9440(95)00543-9
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Studies on low temperature curable powder coatings

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Cited by 29 publications
(12 citation statements)
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“…This situation occurs for instance in the case of blocked isocyanate reacting with an amine. The reaction is described by an overall first-order reaction, zero-order in amine and first-order in blocked isocyanate (for instance, between an oxime blocked isocyanate and an amine, see ref ).…”
Section: Model Reversible Urea/urethane Bonds: the Case Of Blocked Is...mentioning
confidence: 99%
See 1 more Smart Citation
“…This situation occurs for instance in the case of blocked isocyanate reacting with an amine. The reaction is described by an overall first-order reaction, zero-order in amine and first-order in blocked isocyanate (for instance, between an oxime blocked isocyanate and an amine, see ref ).…”
Section: Model Reversible Urea/urethane Bonds: the Case Of Blocked Is...mentioning
confidence: 99%
“…In practical applications, it is however possible to generate a “deblocking temperature” according to the onset temperature of dissociation. As an example, different oxime- and caprolactam-blocked isocyanates were heated in toluene in the presence of amine (1.2–6 equiv relative to blocked isocyanate; Scheme ), and aliquots were analyzed by gas chromatography to record the rate of appearance of urea …”
Section: Model Reversible Urea/urethane Bonds: the Case Of Blocked Is...mentioning
confidence: 99%
“…Hydrophobic substituent is usually incorporated into polyisocyanates to increase the stability of WDPs . On the basis of the optimal formula such as DMBA/MPEG = 3:7 and NCO % = 19.0%, CHDM was introduced into WDPs.…”
Section: Resultsmentioning
confidence: 99%
“…However, some systems have been described in the literature, e.g., systems that cure at temperatures starting at 130°C that are based on blocked isocyanates. 1 Low-temperature curable coatings require an initiator that is activated at the curing temperature but stable at storage temperature, 2 which is difficult to achieve using conventional thermal initiators as we have already explained. At this point UV curing offers a possible solution to this problem since it allows separation of the melting and the film formation stage from the curing stage.…”
Section: Introductionmentioning
confidence: 98%