2020
DOI: 10.1016/j.optmat.2020.109791
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Studies on magnetron sputtered deposited nanocrystalline tungsten oxide films useful for electrochromic devices

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Cited by 18 publications
(4 citation statements)
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“…There are various kinds of methods to fabricate WO 3 EC films, such as magnetron sputtering, 56,66–72 sol–gel, 49,51,73–83 hydrothermal, 37,84–87 electrodeposition, 14,88–91 inkjet printing, 92 self-assembly, 42,93,94 chemical vapor deposition (CVD), 95,96 vacuum evaporation, 53,97–102 and so on. The structure and EC performance of the WO 3 films have obvious differences resulting from the various preparation methods and conditions.…”
Section: Overview Of Wo3 Ec Materialsmentioning
confidence: 99%
“…There are various kinds of methods to fabricate WO 3 EC films, such as magnetron sputtering, 56,66–72 sol–gel, 49,51,73–83 hydrothermal, 37,84–87 electrodeposition, 14,88–91 inkjet printing, 92 self-assembly, 42,93,94 chemical vapor deposition (CVD), 95,96 vacuum evaporation, 53,97–102 and so on. The structure and EC performance of the WO 3 films have obvious differences resulting from the various preparation methods and conditions.…”
Section: Overview Of Wo3 Ec Materialsmentioning
confidence: 99%
“…WO 3 -based EC smart windows made by magnetron sputtering have been commercially accessible as the only EC smart window on the market for more than 10 years [18]. However, several challenges, such as coloring efficiency [10,[19][20][21], are preventing magnetron-sputtered electrochromic smart window performance from being improved. Meanwhile, due to poor EC performance and unreasonably high prices of vacuum equipment and processing, this type of EC smart window has not been extensively implemented [22].…”
Section: Introductionmentioning
confidence: 99%
“…[16] Lee et al reported that the coloration efficiency increased as the substoichiometry increased. [17] Several deposition techniques such as evaporation, [18,19] anodization, [20,21] pulsed laser deposition, [22,23] pulsed spray pyrolysis, [24,25] the solÀgel method, [26] and sputtering [27][28][29][30][31] have been considered for WO 3 fabrication. Sputtering is most often used due to its simplicity, relatively low cost, and ability to produce good-quality films.…”
Section: Introductionmentioning
confidence: 99%