2004
DOI: 10.1023/b:jach.0000015621.31360.14
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Study of anodic layers and their effects on electropolishing of bulk and electroplated films of copper

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Cited by 38 publications
(33 citation statements)
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“…The space between features (i.e., the pattern pitch) was found to be less important, but for a given feature width, the degree of planarization was found to decrease with increasing spacing. Huo et al [16] have recently published an interesting study of electrochemical planarization using four phosphoric-acid-based electrolytes and a 70-wt.% hydroxyethylidenediphosphoric acid (HEDP) electrolyte. They studied electropolishing mechanisms using electrochemical impedance spectroscopy and concluded that in the phosphoric acid electrolyte an acceptor mechanism, discussed in the next section, is probably the best explanation for the limiting-current plateau, in contradiction of the assertions of Chang et al They concluded that a salt-film mechanism prevails for the HEDP electrolyte.…”
Section: Recent Workmentioning
confidence: 99%
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“…The space between features (i.e., the pattern pitch) was found to be less important, but for a given feature width, the degree of planarization was found to decrease with increasing spacing. Huo et al [16] have recently published an interesting study of electrochemical planarization using four phosphoric-acid-based electrolytes and a 70-wt.% hydroxyethylidenediphosphoric acid (HEDP) electrolyte. They studied electropolishing mechanisms using electrochemical impedance spectroscopy and concluded that in the phosphoric acid electrolyte an acceptor mechanism, discussed in the next section, is probably the best explanation for the limiting-current plateau, in contradiction of the assertions of Chang et al They concluded that a salt-film mechanism prevails for the HEDP electrolyte.…”
Section: Recent Workmentioning
confidence: 99%
“…Alternative metal-removal methods should enable high dissolution rates without subjecting the substrate to excessively large pressures. Electrochemical dissolution methods, either as a CMP replacement or a complement to CMP, have received a fair amount of recent attention [8][9][10][11][12][13][14][15][16].…”
Section: Introductionmentioning
confidence: 99%
“…There are two EP mechanisms of Cu and Cu alloys. One is the salt-film mechanism [4,6,14] and the other is the acceptor mechanism [15][16][17]. According to the former mechanism, a salt film with saturated metal ions is developed on the anode surface during the EP process.…”
Section: Introductionmentioning
confidence: 99%
“…In certain systems, the chemical complexation of metal ions with the electrolyte and water molecules will support phase separation and the formation of a viscous liquid phase (viscous layer) adjacent to the anode. [2][3][4][5][6][7][8] The layer of viscous liquid serves as a barrier to the diffusion of ions from the surface of the anode and vice-versa, thereby reducing the efficiency of the electropolishing process. The density of the viscous liquid is assumed to be similar to the density of the electrolyte solution.…”
mentioning
confidence: 99%