Study of beryllium diffusion mechanisms in InGaAs epitaxial layers grown by CBE

Abstract

The aim of this work is to investigate beryllium diffusion during post-growth annealing in InGaAs epitaxial layers. Indeed, this undesirable diffusion may occur during thermal treatments of InGaAs/InP heterojunction bipolar transistors (HBTs), which can generate a limitation of frequency performances of these devices. Epitaxial structures have been grown by chemical beam epitaxy (CBE). After post-growth rapid thermal annealing (RTA) was performed, secondary ion mass spectrometry (SIMS) was used to characterize the Be depth profiles. In parallel with our experimental study, we consider two models of Be diffusion in InGaAs in the case of point defect nonequilibrium. First, a kick-out diffusion model with neutral Be interstitial species and charged point defects was studied. Then, a combined substitutional-interstitial diffusion model based on simultaneous diffusion by dissociative and kick-out mechanisms is suggested. Good agreements between experimental depth profiles and simulated curves have been obtained.

Simulation of p‐type diffusion in compound semiconductor: the case of beryllium implanted in InGaAs

“…The calculations of such an effect for the pairdiffusion mechanism in silicon were performed in [21] ("impurity atom-vacancy" pairs) and in [22,23] ("impurity atom-self-interstitial" pairs). Similar calculations for the kick-out mechanism during diffusion of different impurities in compound semiconductors were performed in [10,14,19,20,24]. All these calculations showed similar results, i.e.…”

“…However, some questions concerning peculiarities of beryllium diffusion are still unresolved because of the limited experimental data. For example, at an earlier stage of investigations it was believed that the diffusion occurred due to the Frank-Turnbull mechanism that involved a vacancy [6] or due to combination of kick-out and the Frank-Turnbull mechanisms [10]. At the present time a kick-out mechanism due to interaction of group III self-interstitial III I q+ with substitutionally dissolved impurity atom Be -via reaction…”