2002
DOI: 10.1016/s0955-2219(01)00427-7
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Study of charging phenomena in MgO single crystal: effect of polishing, annealing temperature and crystallographic orientation

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Cited by 13 publications
(4 citation statements)
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“…MgO is also an ideal dielectric material for the fabrication of electronic devices such as capacitor, transistor, and memory devices [16,20,21]. A considerable amount of literature has reported deposition and characterization of MgO as a thin layer on substrates [20][21][22][23][24]. Improvement in device characteristics can be achieved for MgO particles within the range of 42 to 84 nm [25].…”
Section: Magnesium Oxide As Filler In a Nanocomposite Thinmentioning
confidence: 99%
See 1 more Smart Citation
“…MgO is also an ideal dielectric material for the fabrication of electronic devices such as capacitor, transistor, and memory devices [16,20,21]. A considerable amount of literature has reported deposition and characterization of MgO as a thin layer on substrates [20][21][22][23][24]. Improvement in device characteristics can be achieved for MgO particles within the range of 42 to 84 nm [25].…”
Section: Magnesium Oxide As Filler In a Nanocomposite Thinmentioning
confidence: 99%
“…Dammak and coworkers reported that annealing of MgO nanoparticle at 300°C for 2 hours was essential to remove the moisture and contamination, as well as to allow vaporization of solvent and precursor during processing [24]. This promotes better MgO particle distribution in the polymer matrix.…”
Section: Journal Of Nanomaterialsmentioning
confidence: 99%
“…Mitchell et al [ 30 ] demonstrated that the increased substrate surface roughness reduces critical current density of the YBCO thin film by up to 2−3 times as compared with film produced on a new substrate. Dammak et al [ 33 ] studied the effect of polishing damaged MgO substrates, which resulted in pits and scratches on the polished substrates, as well as thin film degradation due to their transfer onto YBCO layer. Perry et al [ 29 ] investigated the effect of annealing in various gas compositions and found that it was particularly efficient in the regeneration of MgO surfaces from phosphoric acid‐etched samples when annealed in an oxygen environment at a high temperature of 1000 °C.…”
Section: Introductionmentioning
confidence: 99%
“…According to the research of Mitchell [2], the thin film deposited on a rough substrate exhibits a high surface roughness and poor performance, which induces a significant drop of Jc of both the film and the linkage section. The research results of Sangsub Kim [4], Dammak [5] and T.Harada [6] showed that the micro-structure and crystallinity of the ferroelectric thin film deposited on MgO(100) are affected by the surface microstructure or surface profile of the MgO formed through cleavage, polish and anneal. So it is very important for producing high quality thin film not only to choose the right substrate material, but also to obtain the high quality substrate surface.…”
Section: Introductionmentioning
confidence: 99%