Study of Electrical, Mechanical, and Tribological Properties of CrN x Thin Films as a Function of Sputtering Conditions

Khojier, K.; Savaloni, Hadi; Zolghadr, S.; Amani, E.

doi:10.1007/s11665-014-1148-8

Cited by 11 publications

(3 citation statements)

References 31 publications

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“…Few other studies on CrN thin films also resulted in similar data as presented in Figure 18. [133][134][135][136][137] Out of these, the work carried out by Lin et al [138] was on modulated pulsed power (MPP) magnetron sputtering of CrN films on various substrates. It has been concluded that the thicker CrN coatings showed better load bearability and suitable to serve under severe conditions such as higher sliding speeds, loads, and operating temperatures.…”

Section: Surface Properties Of Crn Filmsmentioning

confidence: 99%

Magnetron Sputtered Thin Films Based on Transition Metal Nitride: Structure and Properties

Bharani

Sharma

2022

Physica Status Solidi (a)

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Transition metal nitride (TMN) thin films exhibit outstanding physical, chemical, and mechanical properties, making them best suitable for a wide variety of applications. The most commonly used technique to produce metal nitride thin films with specific properties at optimum conditions is magnetron sputtering. Considering this, this review begins with advancements in the sputtering process from basic diode sputtering to the most commonly used pulsed magnetron sputtering. Further, the literature on several TMNs deposited via magnetron sputtering is summarized, referring to several articles that have been published during the last decades. The main emphasis lies on nitride-based thin films' structural, morphological, and mechanical aspects for various applications. In addition, the influence of reactive gas flow rate, substrate temperature, layer thickness, postannealing temperature, substrate bias voltage, protective layers, the sputtering technique adopted, etc. on the quality and performance of the thin films is also focused. The overall review work can be beneficial for the students and researchers in understanding the basic sputtering phenomenon with its advancements, the relationship between deposition parameters and surface properties, and to know the current research trend for exploring several research gaps in the literature.

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Section: Surface Properties Of Crn Filmsmentioning

confidence: 99%

Magnetron Sputtered Thin Films Based on Transition Metal Nitride: Structure and Properties

Bharani

Sharma

2022

Physica Status Solidi (a)

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“…Indeed, reactive magnetron sputtering coatings with an excess of N can be manufactured under high N 2 flow rates [9][10][11][12]. Nitrogen-rich CrN coatings have already been reported by [13][14][15], and their results showed that films with the N/TM ratio higher than 1 sometimes presented improved mechanical, optical, and magnetic properties as compared with their stoichiometric counterparts, indicating that N-rich TM nitrides could be an interesting choice in the engineering design of thin films.…”

Section: Introductionmentioning

confidence: 97%

Nitrogen-Enriched Cr1−xAlxN Multilayer-Like Coatings Manufactured by Dynamic Glancing Angle Direct Current Magnetron Sputtering

et al. 2020

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Multilayer-like CrN and Cr1−xAlxN coatings with different Al contents were deposited onto a stainless steel substrate using dynamic glancing angle deposition direct current magnetron sputtering (DGLAD dcMS) in a N rich atmosphere to understand the role of Al on the growth of the films and mechanical properties of the nitrides with a multilayer architecture. Chemical analysis by means of energy dispersive analysis (EDS) and glow discharge optical emission spectroscopy (GDOES) depth profiling revealed that while CrN samples were close to stoichiometric, the Cr1−xAlxN coatings presented excess N between 70 and 80% at. An expressive change in texture was observed as the CrN coating changed its preferred orientation from (111) to (200) with the addition of Al, followed by a modification in morphology from grains with faceted pyramidal tops in CrN to dome-shaped grains in Cr1−xAlxN coatings. Multilayer-like nanostructures of corrugated grains were produced with a periodicity of approximately 30 nm using dynamic glancing angle deposition. The deposition rate was drastically reduced with an increase of Al, meanwhile, the best mechanical performance was achieved for the coating with a higher content of Al, with hardness up to 27 GPa and a higher value of maximum resistance to plastic deformation.

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“…Moreover, through the stoichiometry adjustment, the magnetoresistance can be kept to a relatively low value. At present, the CrN thin films have been successfully fabricated by RF reactive magnetron sputtering, molecular beam epitaxy, pulsed laser deposition, ion beam assisted deposition and so on [7,8,[14][15][16][17]. As an alternative approach, chemical solution deposition (CSD) can make the precursor film mix at the atomic level.…”

Section: Introductionmentioning

confidence: 99%

Solution Processable CrN Thin Films: Thickness-Dependent Electrical Transport Properties

Hui

Zuo

et al. 2020

Materials

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Thickness is a very important parameter with which to control the microstructures, along with physical properties in transition-metal nitride thin films. In work presented here, CrN films with different thicknesses (from 26 to 130 nm) were grown by chemical solution deposition. The films are pure phase and polycrystalline. Thickness dependence of microstructures and electrical transport behavior were studied. With the increase of films thickness, grain size and nitrogen content are increased, while resistivity, zero-field sensitivity and magnetoresistance are decreased. In the temperature range of 5–350 K, all samples exhibited semiconductor-like properties with dρ/dT < 0. For the range above and below the Néel temperature, the resistivity can be fitted by the thermal activation model and the two-dimensional weak localization (2D-WL) model, respectively. The ultra-low magnetoresistance at a low temperature under high magnetic fields with a large zero-field sensitivity was observed in the CrN thin films. The zero-field sensitivity can be effectively tuned to 10−2 K−1 at 5 K with a magnetoresistance of less than 1% at 2 K under 14 T by reasonably controlling the thickness.

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Study of Electrical, Mechanical, and Tribological Properties of CrN x Thin Films as a Function of Sputtering Conditions

Cited by 11 publications

References 31 publications

Magnetron Sputtered Thin Films Based on Transition Metal Nitride: Structure and Properties

Magnetron Sputtered Thin Films Based on Transition Metal Nitride: Structure and Properties

Nitrogen-Enriched Cr1−xAlxN Multilayer-Like Coatings Manufactured by Dynamic Glancing Angle Direct Current Magnetron Sputtering

Solution Processable CrN Thin Films: Thickness-Dependent Electrical Transport Properties

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