Study of Fe deposition onto -Al/Si(111) template by scanning tunneling microscopy

Ling, Xi; Ma, Liying; He, Ke; Wang, Zhitao; Xue, Qi‐Kun; Xiao, Xudong; Lau, Woon‐Ming

doi:10.1016/j.susc.2006.05.058

Cited by 5 publications

(2 citation statements)

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“…The present work concentrates on Al/Si(111) model systems. Recently, the Al/Si(111) structures have attracted extensive research effort. − It has been shown that various surface phases may be obtained, such as α-7×7, √3×√3, √7×√7, and γ-phase, depending on growth temperature and Al coverage. The atomic structure of the Al phases has been clearly illustrated (e.g., ref ), and their electronic structures are found to be quite unique because of the space confinement of the surface Al atoms in these 2D superstructures. − These well-defined Al/Si(111) structures offer us good model catalysts with which to study the structure−reactivity relationship.…”

Section: Introductionmentioning

confidence: 99%

“…Recently, the Al/Si(111) structures have attracted extensive research effort. [5][6][7][8][9][10][11][12][13][14][15][16][17][18][19] It has been shown that various surface phases may be obtained, such as R-7×7, 3× 3, 7× 7, and γ-phase, depending on growth temperature and Al coverage. The atomic structure of the Al phases has been clearly illustrated (e.g., ref 8), and their electronic structures are found to be quite unique because of the space confinement of the surface Al atoms in these 2D superstructures.…”

Section: Introductionmentioning

confidence: 99%

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Enhanced Methanol Dissociation on Nanostructured 2D Al Overlayers

Zhang

et al. 2007

J. Phys. Chem. C

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Three well-defined two-dimensional (2D) Al overlayers including the Al/Si(111) α-phase with Al coverage of ∼0.25 ML, the Al/Si(111) γ-phase with Al coverage of ∼0.8 ML, and the bulk Al film with Al coverage of 16 ML on Si(111) have been prepared using the molecular beam epitaxy technique. Their surface morphology and electronic structure were characterized by scanning tunneling microscopy (STM), X-ray photoelectron spectroscopy (XPS), and ultraviolet photoelectron spectroscopy (UPS). The 16 ML Al film presents the metallic Al character, while the nanostructured Al/Si(111) α-phase and γ-phase are semiconducting due to space confinement of the surface Al atoms. The interfacial Al−Si interaction results in electron deficiency in surface Al atoms which follows the order of Al/Si(111) α-phase > Al/Si(111) γ-phase > bulk Al film. Methanol dissociation reactions on the Al surfaces at room temperature were studied by XPS and high-resolution electron energy loss spectroscopy (HREELS). The Al/Si(111) α-phase presents the highest activity for the dissociation of CH3OH and CH3Oads and the lowest activity for the bulk Al film. The exceptional activity of the nanostructured 2D Al surfaces for O−H and C−O bond scission has been attributed to their unique geometric structures as well as their semiconducting and electron-deficient characters.

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