2019 IEEE 26th International Symposium on Physical and Failure Analysis of Integrated Circuits (IPFA) 2019
DOI: 10.1109/ipfa47161.2019.8984802
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Study of Front-Side Approach to Retrieve Stored Data in Non-Volatile Memory Devices Using Scanning Capacitance Microscopy

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Cited by 5 publications
(8 citation statements)
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“…The sample was then delayered from the front side to remove the epoxy molding compound, the passivation layer, metallization layers and the control gate (CG, poly 2), so that the inter-poly oxide layer above the floating gate (FG, poly 1) was exposed (figure 1(a)). The delayering was achieved with techniques typical for failure analysis, including reactive ion etching, chemical etching and polishing, the details of which can be referred to our previous work [14].…”
Section: Methodsmentioning
confidence: 99%
See 1 more Smart Citation
“…The sample was then delayered from the front side to remove the epoxy molding compound, the passivation layer, metallization layers and the control gate (CG, poly 2), so that the inter-poly oxide layer above the floating gate (FG, poly 1) was exposed (figure 1(a)). The delayering was achieved with techniques typical for failure analysis, including reactive ion etching, chemical etching and polishing, the details of which can be referred to our previous work [14].…”
Section: Methodsmentioning
confidence: 99%
“…The high-resolution SNDM mapping of the detailed memory cell structures enables exact correlation of capacitance signal with topography, and therefore provides confidence in data assignment between neighbouring cells. It tackles the long-standing challenge of having accurate data assignment between topography and capacitance signal, as no such structural details are reported in conventional scanning technologies like SCM [6,14]. This high resolution SNDM signal benefits from the precise delayering method from the front side developed by our group [14], as no structural details were observed by Cho's group [12], who presumably used a different front-side delayering approach.…”
Section: Scanning Nonlinear Dielectric Microscopymentioning
confidence: 99%
“…Techniques like scanning electron microscopy (SEM) [7], [8], scanning capacitance microscopy (SCM) [9], [10] scanning non-linear dielectric microscopy (SNDM) [11], [12] and scanning Kelvin probe microscopy (SKPM) [13] have been explored to access the memory data. They can detect electrical signals of capacitance or voltage to differentiate cells with electrons from those without.…”
Section: Introductionmentioning
confidence: 99%
“…Information of "0" and "1" states in Flash memory cells is manifested as charges stored in the floating gates [9]. Direct data retrieval for low-level analysis relies on invasive delayering techniques to expose the memory cells from either backside or frontside [10], followed by characterization based on characteristic electrical or chemical properties of floating gates [11], [12]. The complicated delayering processes and use of advanced characterization instruments limit attackers from attempting invasive approaches [13].…”
Section: Introductionmentioning
confidence: 99%
“…The complicated delayering processes and use of advanced characterization instruments limit attackers from attempting invasive approaches [13]. Literatures on invasive data extraction from Flash memory are very limited, all of which are based on either probing-based techniques or scanning electron microscopy (SEM) [10]- [12], [14]- [19]. The details of documented invasive techniques are summarized in Table I.…”
Section: Introductionmentioning
confidence: 99%