Study of graphene layer growth on dielectric substrate in microwave plasma torch at atmospheric pressure

Jašek, Ondřej; Toman, Jozef; Jurmanová, Jana; Šnírer, Miroslav; Kudrle, Vít; Buršı́ková, Vilma

doi:10.1016/j.diamond.2020.107798

Cited by 20 publications

(15 citation statements)

References 39 publications

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“…However, the separate planar graphene akes covered only a tiny part of the substrate. 12 In some studies, the graphene ake orientation was changed via controlling the methane and etching gas ow ratios without reporting the use of Faraday-cage-type protective shields. Notably, vertical graphene was grown on silicon via microwave PECVD using CH 4 /H 2 gas ow ratios higher than 5.5, and horizontal graphene was synthesized using lower methane/ hydrogen gas ow ratios.…”

Section: Introductionmentioning

confidence: 99%

“…9 Some studies have shown the growth of vertical and planar graphene in the same PECVD system on dielectric or semiconducting substrates. 5,[11][12][13][14][15][16] Switching between the growth of planar and vertical graphene on a glass substrate can be achieved using a copperfoam-based Faraday cage with different pore sizes. 5 However, this method has some disadvantages.…”

Section: Introductionmentioning

confidence: 99%

“…Some studies have shown the growth of vertical and planar graphene in the same PECVD system on dielectric or semiconducting substrates. 5,11–16…”

Section: Introductionmentioning

confidence: 99%

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The direct growth of planar and vertical graphene on Si(100) via microwave plasma chemical vapor deposition: synthesis conditions effects

et al. 2022

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Section: Introductionmentioning

confidence: 99%

Section: Introductionmentioning

confidence: 99%

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The direct growth of planar and vertical graphene on Si(100) via microwave plasma chemical vapor deposition: synthesis conditions effects

et al. 2022

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“…The GSG is formed in the afterglow region of plasma discharge where nucleation and growth take place [27,28]. Microwave (MW)-induced plasma is predominantly utilized for such synthesis [29][30][31]. Jašek et al [31] deposited GSG layers from ethanol vapors in argon in this way.…”

Section: Introductionmentioning

confidence: 99%

“…Microwave (MW)-induced plasma is predominantly utilized for such synthesis [29][30][31]. Jašek et al [31] deposited GSG layers from ethanol vapors in argon in this way. Such plasma heated the Si/SiO 2 substrate to ~650-1150 • C, depending on plasma conditions.…”

Section: Introductionmentioning

confidence: 99%

Applicability of Atmospheric Pressure Plasma Jet (APPJ) Discharge for the Reduction in Graphene Oxide Films and Synthesis of Carbon Nanomaterials

Kumar

Ibaceta-Jaña

Maticuic

et al. 2021

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Atmospheric pressure plasma jets (APPJ) are widely used in industry for surface cleaning and chemical modification. In the recent past, they have gained more scientific attention especially in the processing of carbon nanomaterials. In this work, a novel power generation technique was applied to realize the stable discharge in N2 (10 vol.% H2) forming gas in ambient conditions. This APPJ was used to reduce solution-processed graphene oxide (GO) thin films and the result was compared with an established and optimized reduction process in a low–pressure capacitively coupled (CCP) radiofrequency (RF) hydrogen (H2) plasma. The reduced GO (rGO) films were investigated by Raman spectroscopy and X-ray photoelectron spectroscopy (XPS). Effective deoxygenation of GO was observed after a quick 2 s treatment by AAPJ. Further deoxygenation at longer exposure times was found to proceed with the expense of GO–structure integrity. By adding acetylene gas into the same APPJ, carbon nanomaterials on various substrates were synthesized. The carbon materials were characterized by Raman spectroscopy, scanning electron microscopy (SEM), and energy-dispersive X-ray (EDX) analyses. Fullerene-like particles and graphitic carbon with short carbon nanotubes were detected on Si and Ag surfaces, respectively. We demonstrate that the APPJ tool has obvious potential for the versatile processing of carbon nanomaterials.

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Plasma‐Based Synthesis of Freestanding Graphene from a Natural Resource for Sensing Application

Zafar

Liu

Hernández

et al. 2023

Adv Materials Inter

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The bottomup approach, that is, modified Hummers' method, is a well-established chemical synthesis technique to synthesize graphene. However, this technique, not only utilizes strong acids and oxidants [4,5] but also entails numerous steps of synthesis such as dilution, mixing, oxidation, reduction, washing, centrifuging, and intense stirring. [6] On the other hand, some of the bottom-up methods, in particular, chemical vapor deposition (CVD) and plasma-enhanced chemical vapor deposition (PE-CVD) are expensive and laborious methodologies comprising pre-synthesis and post-synthesis requirements, that is, high vacuum, pre-heating, and subsequent transfer of graphene to other substrates. [7][8][9] Recently, a new bottom-up approach, so-called atmospheric pressure microwave plasma (APMP) is gaining popularity as it synthesizes graphene without the hassles of pre-heating, high vacuuming, and the need for a substrate. Most importantly, the graphene obtained through this method happens to be freestanding and scalable. [10,11] The precursors used for producing graphene have a significant role in determining the sustainability of the synthesis process. Often graphene is produced from commercially available graphite, [12] graphene oxide (GO), [13] methane, or other unreplenishable hydrocarbons. [14] These resources Atmospheric pressure microwave plasma has the lead in synthesizing freestanding and scalable graphene within seconds without the need for high vacuum and temperature. However, the process is limited in utilizing chemical sources for synthesis, such as methane and ethanol. Herein, the usage of an extract of a sustainable precursor, that is, Melaleuca alternifolia, commonly known as tea tree, is for the first time reported to synthesize graphene nanosheets in atmospheric pressure microwave plasma. The synthesis is carried out in a single step at a remarkably low microwave power of 200 W. The morphology, structure, and electrochemical properties of graphene are studied using state-of-the-art characterization techniques such as Raman spectroscopy, X-ray diffraction, transmission electron microscopy (TEM) and electrochemical impedance spectroscopy. The TEM images reveal the presence of a combination of nanostructures such as nano-horns, nano-rods, or nano-onions consisting of multi-layer graphitic architectures. An excellent sensing capability of as-synthesized graphene is demonstrated through the detection of diuron herbicide. A commendable linear range of 20 µm to 1 mm and a limit of detection of 5 µm of diuron is recorded.

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Study of graphene layer growth on dielectric substrate in microwave plasma torch at atmospheric pressure

Cited by 20 publications

References 39 publications

The direct growth of planar and vertical graphene on Si(100) via microwave plasma chemical vapor deposition: synthesis conditions effects

The direct growth of planar and vertical graphene on Si(100) via microwave plasma chemical vapor deposition: synthesis conditions effects

Applicability of Atmospheric Pressure Plasma Jet (APPJ) Discharge for the Reduction in Graphene Oxide Films and Synthesis of Carbon Nanomaterials

Plasma‐Based Synthesis of Freestanding Graphene from a Natural Resource for Sensing Application

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