Study of nano-imprint for sub-100-nm patterning by using SU-8 3000NIL resist

Sekiguchi, Atsushi; Kono, Yoshiyuki; Mori, Satoshi; Honda, Nao; Hirai, Yoshihiko

doi:10.1117/12.656310

Cited by 3 publications

(4 citation statements)

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“…The key element for nanoimprint lithography is the resist material. Epoxy systems, such as SU-8 and mr-NIL 6000 resists, were common materials for NIL. , Our epoxy/inorganic hybrid resists were thermocurable resins for low-pressure and moderate-temperature NIL. The thermocurable epoxy/inorganic hybrid resists are different significantly from the SU-8 and mr-NIL 6000 in the solvent aspect.…”

Section: Resultsmentioning

confidence: 99%

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Preparation of Epoxy/Silica and Epoxy/Titania Hybrid Resists via a Sol−Gel Process for Nanoimprint Lithography

Hsu

2010

J. Phys. Chem. C

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In this study, the solvent-free thermocurable epoxy/inorganic hybrid resists were prepared for low-pressure and moderate-temperature imprint lithography. Epoxy/silica and epoxy/titania hybrid resists were synthesized via a sol-gel process from a diglycidyl ether of bisphenol A prepolymer with a metal alkoxide precursor and a coupling agent, 3-glycidyloxypropyltrimethoxysilane. The introduction of the coupling agent results in the reinforced interfacial interaction between the epoxy resin and inorganic nanoparticles. Transmission electron microscopy analyses showed that the silica or titania particles were well-dispersed in the epoxy resin matrix on a nanometer scale without the formation of aggregates. The thermooxidative stability and the glass-transition temperature (T g ) of the epoxy/silica nanocomposite showed improvement compared with the pure epoxy resin. When 10 wt % inorganic nanoparticles were added, the etching resistance of the epoxy/silica and epoxy/ titania nanocomposites increased 4 and 3.2 times, respectively, compared with the pure epoxy resin. The epoxy/inorganic hybrid resist can be imprinted to obtain high-density patterns with a resolution of 110-500 nm on a flexible indium tin oxide/poly(ethylene terephthalate) substrate. The shrinkage of the epoxy/silica and epoxy/titania hybrid resist imprinted patterns decreased to 1.5% and 1.3%, respectively.

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Section: Resultsmentioning

confidence: 99%

“…The bubbles were obviously produced in the resist film after coating or during the prebake process. Residual solvent could cause hole-shaped defects after the imprinting . The mr-NIL 6000 tends to form defects in thin (below 100−200 nm) spin-coated films, especially pin holes and inhomogeneities…”

Section: Resultsmentioning

confidence: 99%

Preparation of Epoxy/Silica and Epoxy/Titania Hybrid Resists via a Sol−Gel Process for Nanoimprint Lithography

Hsu

2010

J. Phys. Chem. C

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“…*wissen@uni-wuppertal.de; phone +49 202 439-1805; fax +49 202 As shown earlier 9 , a chemically amplified, epoxy containing negative tone photoresist based on NANO TM SU-8 (microchem Corp., USA) has been successfully imprinted prior to a superimposed UV-L. In the same manner the original SU-8 photoresist could be imprinted without UV sensitivity loss 10,11 . In fact, all photoresists having thermoplastic behavior that can be imprinted without loss of their UV sensitivity are adequate candidates for a hybrid lithography of T-NIL and UV-L.…”

Section: Introductionmentioning

confidence: 91%

Strategies for hybrid techniques of UV lithography and thermal nanoimprint

et al. 2008

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This paper discusses a hybrid process of thermal nanoimprint and UV lithography, carried out within UV curable SU-8 and mr-L 6000.5, respectively, on the basis of experiments and calculations of the light intensity distribution within the photoresist. For the non-transparent Si stamps with mixed pattern sizes, ranging from approx. 100nm to 150µm, the experiments revealed an optimum imprint temperature of 80°C for SU-8 and 70°C to 100°C for mr-L 6000.5. UV stabilization of the imprinted patterns after stamp removal is possible with negligible loss of the patterns when a broadband UV exposure is applied and the post exposure bake is performed as a temperature ramp, starting in the range of the glass transition temperature of the photoresists. UV stabilized patterns of mr-L 6000.5 can be replicated themselves (working-stamp), after applying a conventional anti-adhesive coating. A successful hybrid lithography of thermal nanoimprint lithography and UV lithography depends on the exposure conditions as well as on the layout of the stamp patterns with respect to the photomask pattern. Superimposing the patterns of a photomask is only uncritical for imprinted patterns in the range of the exposure wavelength and larger, where a trench may develop underneath the edges of imprinted patterns of ≥1µm width. This is due to a shadowing effect caused by exposure over topography. A sufficient stabilization of smaller imprinted patterns in the range of 100nm within a hybrid lithography approach is only feasible when the photomask patterns are not in direct vicinity of the pre-patterned photoresist.

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“…We applied a coat of SU-8 (Nippon Kayaku Co., Ltd.) [35,36] to a quartz substrate and nanoimprinted using the 200 nm hole pattern mold. There is a pattern, and it shows the water repellency of a hardened film at the time without a pattern to Fig.…”

Section: Su-8 (Thermosetting Epoxy Resin)mentioning

confidence: 99%

Developing a Laparoscope Lens with Super Water-Repellent Antifouling Function using Biomimetic Materials

Sekiguchi,

Minami,

Yasuda

et al. 2023

J. Photopol. Sci. Technol.

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Laparoscopes are now widely used in clinical settings. Laparoscopes are particularly useful in detecting cancers and excising affected areas. During laparoscopic operations, however, the spatter of blood and bodily fluids resulting from the excision of the affected area can fog the objective lens. Condensation on the lens caused by temperature differences between the instrument interior and exterior can also obscure vision. Any obstruction of the field of view during the surgical procedure must be addressed by cleaning the lens at the tip; however, doing so prolongs the time required for the procedure, makes it more invasive, and increases patient burdens. Drawing on biomimicry principles, we developed a laparoscope lens with super water-repellent and antifouling properties. This paper reports our results.

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Study of nano-imprint for sub-100-nm patterning by using SU-8 3000NIL resist

Cited by 3 publications

References 0 publications

Preparation of Epoxy/Silica and Epoxy/Titania Hybrid Resists via a Sol−Gel Process for Nanoimprint Lithography

Preparation of Epoxy/Silica and Epoxy/Titania Hybrid Resists via a Sol−Gel Process for Nanoimprint Lithography

Strategies for hybrid techniques of UV lithography and thermal nanoimprint

Developing a Laparoscope Lens with Super Water-Repellent Antifouling Function using Biomimetic Materials

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