Proceedings. 7th International Conference on Solid-State and Integrated Circuits Technology, 2004. 2004
DOI: 10.1109/icsict.2004.1435038
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Study of nitridation plasma for ultra-thin gate dielectrics of 65 nm technology node and beyond

Heping Wu
1
,
Doohoon Goo
2
,
Mingshu Mo
3
et al.
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