Study of Optical and Electrical Properties of Nickel Oxide (NiO) Thin Films Deposited by Using a Spray Pyrolysis Technique

Abstract

Nickel oxide (NiO) thin film has been deposited on a glass substrate at a temperature of 390˚C ± 10˚C using a simple and inexpensive spray pyrolysis technique. Nickel nitrate salt solution (Ni(NO 3 ) 2 •6H 2 O) was employed to prepare the films and the film thickness was in order of 200 ± 5 nm. The structural, optical and electrical properties of NiO films were investigated using X-ray diffraction (XRD), visible spectrum, DC conductivity and Seebeck effect measurements. The results show that X-ray diffraction techniques have shown that prepared film is polycrystalline structure type cubic phase. The measurements of optical properties (transmittance (T) and absorbance (A)) of NiO films show that higher transmittance is 37.4% within the wavelength range (300 -900 nm). Also the results have shown that the higher absorbance is 77.7%. The results of electrical properties have shown that at room temperature electrical conductivity is 1.3 × 10 −5 (Ω•cm) −1 , and also results have shown that all the films are of p-type due to the negative Seebeck coefficient.

Improving Uniformity and Reproducibility of Hybrid Perovskite Solar Cells via a Low-Temperature Vacuum Deposition Process for NiOx Hole Transport Layers

“…These values are similar to values reported elsewhere. 45,46 These results, therefore, further confirm the previous results, where the eb-NiO x PVSCs were shown to have smaller series resistance, which leads to larger FF in device performance. In addition, the existence of more Ni 3+ ions in eb-NiO x films is responsible for producing color centers.…”

“…The results confirm that the eb-NiO x is less resistive (and thus more conductive) than the sc-NiO x , with resistivity values of (2.51 ± 0.07) × 10 4 and (9.50 ± 0.98) × 10 4 Ω cm, respectively. These values are similar to values reported elsewhere. , …”

Degradation and regeneration mechanisms of NiO protective layers deposited by ALD on photoanodes

“…2), reduced with lower deposition temperatures 36 . NiO is known to be less transparent when increasingly defective 36,44,45 . This is expected to be directly translated into reduced maximum saturation photocurrent for photoanodes under illumination.…”

Inkjet printing of NiO films and integration as hole transporting layers in polymer solar cells

“…Among these candidates, NiO is a good choice because it is a very stable oxide, is a known p-type material and NiO thin films can be deposited using both physical vapour deposition 22 , electrodeposition 23 , 24 , chemical bath deposition 25 as well as spray pyrolysis 26 methods. Irwin et al .…”