Study of optical emission spectroscopy using modified Boltzmann plot in dual-frequency synchronized pulsed capacitively coupled discharges with DC bias at low-pressure in Ar/O2/C4F8 plasma etching process

Sahu, Bibhuti Bhusan; Nakane, Kazuhiko; Ishikawa, Kenji; Sekine, Makoto; Tsutsumi, Takayoshi; Gohira, Taku; Ohya, Yoshinobu; Ohno, Noriyasu; Hori, Masaru

doi:10.1039/d2cp00289b

Cited by 6 publications

(2 citation statements)

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“…57,58) Phase-resolved OES data were analyzed by the corona model and local thermal equilibrium approximations that are satisfied by simultaneously the Boltzmann and Saha equations for to determine the plasma density and Te. 59) The plasma density in the afterglow speedily decreased within a short time of approximately 5 μs. The production of ion-ion plasmas by the effective utilization of negative ions in the afterglow phase was suggested.…”

Section: 5mentioning

confidence: 97%

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Science-based, data-driven developments in plasma processing for material synthesis and device-integration technologies

Kambara

Kawaguchi

Lee

et al. 2022

Jpn. J. Appl. Phys.

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Low-temperature plasma processing technologies is essential for material synthesis, device fabrication, and surface treatment. The development of plasma-related products and services requires an understanding of the multiscale complex behaviors of plasma and the hierarchical integration of plasma generation, energy and mass transports through sheath region, surface reactions, and other processes. The importance of science-based and data-driven approaches to controlling systems is argued. The state-of-the-art of deep learning, machine learning, and artificial intelligence in low-temperature plasma science and technology is reviewed. In this review, the requirements and challenges for plasma parameter prediction and processing recipe discovery are asserted by researchers in the fields of material science and plasma processing. It also outlined a science-based, data-driven approach for development of virtual metrology in plasma processes.

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Section: 5mentioning

confidence: 97%

“…The production of ion-ion plasmas by the effective utilization of negative ions in the afterglow phase was suggested. 59) Makabe et al reviewed the electronegativity of reactive plasmas 60) (Fig. 14).…”

Section: 5mentioning

confidence: 99%