2017
DOI: 10.1016/j.infrared.2016.11.004
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Study of resonant modes in a 700 nm pitch macroporous silicon photonic crystal

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Cited by 7 publications
(6 citation statements)
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“…Fabrication of macroporous silicon narrow filters.-Before photoelectrochemical etching, several pre-processes -i.e. implantation, oxidation, lithography, etc.-had to be carried out in order to prepare the samples -details can be consulted elsewhere [17][18][19][20][21][22] -. As a result of this initial step, the front surface of the samples was pre-structured with a square array of inverted pyramids separated by a pitch of 700 nm.…”
Section: Methodsmentioning
confidence: 99%
“…Fabrication of macroporous silicon narrow filters.-Before photoelectrochemical etching, several pre-processes -i.e. implantation, oxidation, lithography, etc.-had to be carried out in order to prepare the samples -details can be consulted elsewhere [17][18][19][20][21][22] -. As a result of this initial step, the front surface of the samples was pre-structured with a square array of inverted pyramids separated by a pitch of 700 nm.…”
Section: Methodsmentioning
confidence: 99%
“…Transmission spectra, measured and simulated, for two (B) and three (C) cavities. (Cardador et al, 2017b) 5 500 NM PROCESS In the case of the lower periodicity structures that we have fabricated, the pores are also arranged in a square lattice, but of 500 nm periodicity, and the pore diameter range from around 200 nm to 350 nm. The results show straight pores with good uniformity and controlled dimensions.…”
Section: From Single Cavity To Multiple Resonant Cavitiesmentioning
confidence: 99%
“…For example, it is possible to create resonant cavities inside the MpS samples by changing one or several cycles of the profile at a certain depth. In this way, single and multiple resonators have been designed by tailoring the modulations of the pores (Cardador et al, 2017b). These cavities create reflection and transmission peaks in the spectral response of the samples.…”
Section: Submicron Manufacturing Technologymentioning
confidence: 99%