“…TE deposition has developed as an attractive technique for the growth of high-quality thin films on substrates due to the direct-line propagation of evaporated nanoparticles (NPs) from the target to the substrate, the high rate of deposition with low impurity levels, the low tendency to oxidize in the deposited layer, and the low cost of preparation (Nassar et al 2016). The physical properties of CdTe thin films were improved by changing the deposition parameters, such as the growth rate, film thickness, deposition angle, substrate properties and substrate temperature during the deposition process or postdeposition treatment (Sestak et al 2011, Spalatu et al 2015, Chander and Dhaka 2015b, Hasani and Raoufi 2018a, Lai et al 2019, Hasani et al 2020, 2021. Thermal annealing in air, vacuum and gas (N2, H2, Ar, etc) as well as treatment with CdCl 2 and pressure can also improve the physical properties of CdTe films.…”