Study of substrate temperature effects on structural, optical, mechanical and opto-thermal properties of NiO sprayed semiconductor thin films

Boukhachem, A.; Boughalmi, R.; Karyaoui, M.; Mhamdi, A.; Chtourou, R.; Boubaker, K.; Amlouk, M.

doi:10.1016/j.mseb.2014.06.001

Cited by 51 publications

(16 citation statements)

References 48 publications

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“…So, the improvement of the transmittance for annealed NiO films could be related to decrease in optical scattering processes after annealed. This kind of effect has been reported by Boukhachem et al [27].…”

Section: Resultssupporting

confidence: 80%

The Optical, Electrical and Surface Differences between As-Deposited and Annealed NiO Films Produced by Ultrasonic Spray Pyrolysis

Gençyılmaz¹,

Atay²,

Akyüz³

2015

MUFBED

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The interest in NiO films has been growing fast due to their importance in many applications in science and technology. NiO films are an attractive material and are used common application area such as an antiferromagnetic layer, p-type transparent conducting film, electrochromic devices and chemical sensors. Also, NiO is a good candidate for p-type semiconductor films due to its wide band gap energy from 3.6 to 4.0 eV. In this work, NiO films have been grown on glass substrates by ultrasonic spray pyrolysis technique using NiCl 2 .6H 2 O as spraying solution. Films have been annealed at 500 °C in air during 1 h. Optical measurements of NiO film have been carried out at room temperature using a UV-VIS spectrophotometer. Band gap of as-deposited and annealed films have been calculated by using optical method and found as 3.67 eV and 3.7 eV, respectively. Thicknesses of the films have been determined by filmetrics thin film measurement system. Surface properties of the films have been investigated with an atomic force microscope and electrical resistivity measurements have been performed by a four probe set-up. Consequently, the optical, electrical and surface differences have been determined between as-deposited and annealed NiO films produced by ultrasonic spray pyrolysis.

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Section: Resultssupporting

confidence: 80%

The Optical, Electrical and Surface Differences between As-Deposited and Annealed NiO Films Produced by Ultrasonic Spray Pyrolysis

Gençyılmaz¹,

Atay²,

Akyüz³

2015

MUFBED

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“…The amount of micro strain present in NiO was calculated from the (1 1 1) peak of NiO using Eq. (2) and it was found to be ∼0.0057.Researchers have reported the lowest strain of 0.0035 in NiO thin films which was ∼38% lower than the value obtained for 400 • C annealed coating [20]. This clearly indicates the presence of micro strain and hence, observed the Raman shift towards higher wave number in 400 • C annealed coating.…”

Section: Phase Analysismentioning

confidence: 81%

Crystallization mechanism and corrosion property of electroless nickel phosphorus coating during intermediate temperature oxidation

Sribalaji

Arunkumar

Babu

et al. 2015

Applied Surface Science

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“…finally; spraying temperature was fixed at 450°C. This temperature seems optimal for this II-VI binary thin films preparation [27,28].…”

Section: Thin Films Preparation and Characterization Techniquesmentioning

confidence: 99%

“…Among these techniques, spray pyrolysis is the widely used; it is an attractive process to obtain thin films which requires low cost raw materials, adherent of deposits, very easy, safe and cheap. Furthermore, this technique leads to a large production area and it is special to give crystallized thin films without recourse to thermal processing Its deposition on glass like substrates has been widely experimented and applied [27][28][29]. On the other hand, NiO has been the subject of many research works in terms of doping.…”

Section: Introductionmentioning

confidence: 99%

Optical, Physical, Chemical and Electrical Properties of Nickel Oxide Sprayed Thin Films under Tin Doping Effects

Amor¹,

Hamzaoui²,

Boukhachem³

et al. 2015

Advances in Ceramic Science and Engineering

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Tin-doped nickel oxide thin films have been successfully prepared by spray pyrolysis technique on glass substrates at 460°C. The effects of tin doping on structural, optical, and electrical properties were investigated. X-ray diffraction pattern reveals that all prepared thin films have cubic structure with (111) preferred orientation. The surface topography of these films was performed by atomic force microscopy. Optical measurements show a high transparency in the visible range around 95%. The optical band gap Eg decreases with Sn content from 3.633 to 3.54 eV. PL measurements show some bands transition which shift irregularly with Sn doping. Finally, the electric conductivity of NiO thin film was investigated through the impedance spectroscopy measurements in the frequency range 5 Hz-13 MHz at various temperatures. These measurements show a thermally activation of the electric. AC conductivity of NiO thin films is investigated through Jonscher law. Also, from these measurements, dielectric parameters were calculated.

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Study of substrate temperature effects on structural, optical, mechanical and opto-thermal properties of NiO sprayed semiconductor thin films

Cited by 51 publications

References 48 publications

The Optical, Electrical and Surface Differences between As-Deposited and Annealed NiO Films Produced by Ultrasonic Spray Pyrolysis

The Optical, Electrical and Surface Differences between As-Deposited and Annealed NiO Films Produced by Ultrasonic Spray Pyrolysis

Crystallization mechanism and corrosion property of electroless nickel phosphorus coating during intermediate temperature oxidation

Optical, Physical, Chemical and Electrical Properties of Nickel Oxide Sprayed Thin Films under Tin Doping Effects

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