“…An argon etching process was conducted using an ion gun (beam energy, 4 keV; diameter, 1 mm) to evaluate the tribofilm thickness and depth profile. Narrow-scan XPS spectra were acquired after each cycle of the etching process, which was conducted for 0, 1, 3, 6, 10, 30, 50, 100, 200, and 400 s. Casa XPS software was used to fit the obtained peaks and the peaks were assigned in reference to the online database [28] and several previous reports [10,25,29]. Quantification was made by referring to relative sensitive factors.…”