Study of Swelling Behavior in ArF Resist during Development by the QCM Method (3) - Observations of Swelling Layer Elastic Modulus -

Abstract

The QCM method allows measurements of impedance, an index of swelling layer viscosity in a photoresist during development. While impedance is sometimes used as a qualitative index of change in the viscosity of the swelling layer, it has not so far been used quantitatively, for data analysis. We explored a method for converting impedance values to elastic modulus (Pa) and a coefficient expressing viscosity. Applying this method, we compared changes in the viscosity of the swelling layer in an ArF resist generated during development in a TMAH developing solution and in a TBAH developing solution. This paper reports the results of this comparative study.

Sensitization of polymethacrylate resist with adding acid-generating promoters upon exposure to EUV light

“…In addition to the initial acid yield, there are other factors that can affect CAR sensitivity, such as acid diffusion and deprotection 116503-3 © 2023 The Japan Society of Applied Physics during PEB. 36,[42][43][44][45][46] The factors behind the higher sensitivity of P1 will be discussed later.…”

“…In particular, the dissolution properties of polymers in developer solutions have been studied extensively. Thus far, the dissolution properties of KrF, 43,46) ArF, [46][47][48] EB resists, 49,50) and EUV resists and model polymers [51][52][53][54][55][56][57][58] during development have been studied with the advancement of lithographic technology. The resist sensitivity can be determined from whether the initial film elutes into the developer or remains undissolved in the development process when the exposure dose is changed.…”

Dissolution dynamics of partially protected poly(4-hydroxystyrene) in tetraalkylammonium hydroxide aqueous solution

“…The PHS solution was dropped onto the QCM substrate, spin-coated, and prebaked at 90 °C for 90 s. The coated film was developed in a strong basic aqueous developer, and the dissolution dynamics were measured using a QCM-based development analyzer (Litho Tech Japan RDAQz3). 21) After measurement, the film was rinsed with distilled water. Film thickness before and after development was measured with an ellipsometer (Meiwafosis FS-1).…”

Electrostatic effect on the dissolution kinetics of poly(4-hydroxystyrene) in alkaline aqueous solution

“…Not only the study described above but also other studies have attempted to describe the relationship between physical properties and observed impedance values quantitatively. [21][22][23][24] However, note that it is difficult to quantitatively explain changes in a heterogeneous material consisting of multiple layers such as a film during development. Hence, we used impedance changes as a qualitative indicator in this study.…”