2004
DOI: 10.1016/j.apsusc.2003.10.001
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Study of the chemical behavior of hydrofluoric, nitric and sulfuric acids mixtures applied to niobium polishing

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Cited by 30 publications
(26 citation statements)
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“…In the acidic mixture of HF + HNO3 + H2SO4, each of the aqueous solution constituent plays an important role: acids generally act as proton donors, NO3from HNO3 oxidizes niobium, HF is an aggressive complexing agent that dissolves niobium oxides and niobium metal, and niobium fluoride complexes are a main source for the deposition of metallic niobium [22]. Finally, SO4 2ions act as an additional complexing agent for niobium oxide species [28].…”
Section: Resultsmentioning
confidence: 99%
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“…In the acidic mixture of HF + HNO3 + H2SO4, each of the aqueous solution constituent plays an important role: acids generally act as proton donors, NO3from HNO3 oxidizes niobium, HF is an aggressive complexing agent that dissolves niobium oxides and niobium metal, and niobium fluoride complexes are a main source for the deposition of metallic niobium [22]. Finally, SO4 2ions act as an additional complexing agent for niobium oxide species [28].…”
Section: Resultsmentioning
confidence: 99%
“…In solution C, which does not contain H2SO4, GC reversible potential moved further to more negative values (0.460 V vs. SCE). This should be attributed to an increased concentration of active niobium ions that are not engaged in complexes made with sulphate anions [28]. A niobium anode was applied as a compensating source of niobium ions in the used solutions.…”
Section: Resultsmentioning
confidence: 99%
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