Study of the deposition of Ti/TiN multilayers by magnetron sputtering

Abstract

In this study, we present the effect of the plasma deposition parameters on the electrical and structural properties of Ti/TiN multilayers. The films were formed by r.f. magnetron sputtering (13.56 MHz) under nitrogen and argon reactive plasma at low pressure. The first step of our study was the optimization of the deposition conditions in order to obtain good-quality films. The total pressure was set between 2 and 10 mTorr. The primary result is that the self-bias voltage plays a major role in the structural evolution of TiN films by changing the preferred film orientation and their hardness. The variation of the resistivity as the function of substrate bias was also investigated. The deposited multilayers were characterized by X-ray diffraction (XRD), energy dispersive spectroscopy (EDS), and Raman scattering analysis, as well as by the standard four-probe technique.

Magnetron sputtered TiN thin films toward enhanced performance supercapacitor electrodes

“…1b. The characteristic peaks centered at ~ 210, 320 and 520-590 cm −1 are assigned to TiN Raman scattering, induced by acoustical phonons and optical phonons, respectively, thereby further confirming the formation of TiN phase [19,20]. Information on the chemical bonding states of TiN thin films were examined by XPS characterization.…”

Structural and tribological properties of DC reactive magnetron sputtered titanium/titanium nitride (Ti/TiN) multilayered coatings

“…The Ti/TiN multilayer films can be deposited by rf magnetron sputtering [13], dc magnetron sputtering [14], laser ablation [15], pulsed laser deposition [16], hollow cathode ion plating [17], vacuum arc [18] and arc ion plating [19]. Ti/TiN multilayered coatings deposited by a reactive magnetron sputtering have found many virtues, e.g.…”

AES depth profiles in Mo-coated 304L stainless steel achieved by RF-magnetron sputtering and influence of Mo on the corrosion in 3.5% NaCl solution

“…The sputtering system was described in more details in a previous work [16]. The deposition chamber (shown in the experimental set up in Fig.…”