Study of the Long-Term High-Temperature Structural Stability of RuAl Electrodes for Microelectronic Devices
Marietta Seifert,
Barbara Leszczynska,
Thomas Gemming
Abstract:The high-temperature stability of RuAl-based electrodes for application in microelectronic devices is analyzed for long-term duration. The electrodes are prepared on Ca3TaGa3Si2O14 (CTGS) substrates using SiO2 and Al-N-O cover and barrier layers as oxidation protection. The samples are annealed at 600, 700, or 800 °C in air for 192 h. Minor degradation is observed after thermal loading at 700 °C. The annealing at 800 °C for 192 h leads to a partial oxidation of the Al in the extended contact pad and to a compl… Show more
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