Study of TiN Film Adhesion Strength by Pulsed-Laser Shock Detection Method

Abstract

Bonding strength of the interface of film-substratum is an important factor and key problem that influence the reliability and usage of film-substratum system. The new technology of pulsed-laser shock detection method which analyzes the mechanism and mathematical model of film separation under the action of pulsed-laser shock,. With the example of measuring the adhesion strength of TiN/SKD11 film system, the surface was respectively impacted with pulsed-laser at the range of 650~1000mJ. To observe the surface topography of Impact points by scanning electron microscope, and to identify TiN film failure threshold by the reflected signal detection. By analyzing the experimental result, it was suggested that film/substrate interfacial adhesion strength was 4.954GW/cm2.