2020
DOI: 10.3390/electronics9101573
|View full text |Cite
|
Sign up to set email alerts
|

Study on Characteristics of Enhancement-Mode Gallium-Nitride High-Electron-Mobility Transistor for the Design of Gate Drivers

Abstract: An enhancement-mode gallium-nitride high-electron-mobility transistor (E-mode GaN HEMT) operated at high frequency is highly prone to current spikes (di/dt) and voltage spikes (dv/dt) in the parasitic inductor of its circuit, resulting in damage to the power switch. To highlight the phenomena of di/dt and dv/dt, this study connected the drain, source, and gate terminals in series with inductors (LD, LS, and LG, respectively). The objective was to explore the effects of di/dt and dv/dt phenomena and operating f… Show more

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
1

Citation Types

0
1
0

Year Published

2021
2021
2021
2021

Publication Types

Select...
1

Relationship

0
1

Authors

Journals

citations
Cited by 1 publication
(1 citation statement)
references
References 11 publications
0
1
0
Order By: Relevance
“…Recently, significant efforts have been made by researchers in wide bandgap (WBG) power devices owing to their superior characteristics and properties over that of current dominant Si devices, such as higher breakdown field, higher mobility and higher power density [2][3][4][5]. GaN-based device has been assumed as a very promising candidate in the low-medium voltage range applications [6][7][8][9][10][11][12], owing to GaN device presents excellent performance in accordance with its theoretical characteristics and corresponding technological process among all potential candidates [13]. Currently, there are two types of GaN power devices available in the commercial market, namely, enhancement-mode GaNFETs and cascode GaNFETs.…”
Section: Introductionmentioning
confidence: 99%
“…Recently, significant efforts have been made by researchers in wide bandgap (WBG) power devices owing to their superior characteristics and properties over that of current dominant Si devices, such as higher breakdown field, higher mobility and higher power density [2][3][4][5]. GaN-based device has been assumed as a very promising candidate in the low-medium voltage range applications [6][7][8][9][10][11][12], owing to GaN device presents excellent performance in accordance with its theoretical characteristics and corresponding technological process among all potential candidates [13]. Currently, there are two types of GaN power devices available in the commercial market, namely, enhancement-mode GaNFETs and cascode GaNFETs.…”
Section: Introductionmentioning
confidence: 99%