This study demonstrates
the application of Al2O3 coatings for the high-voltage
cathode material LiNi0.5–x
Mn1.5+x
O4−δ (LNMO) by
atomic layer deposition. The ultrathin and uniform coatings
(0.6–1.7 nm) were deposited on LNMO particles and characterized
by scanning transmission electron microscopy, inductively coupled
plasma mass spectrometry, and X-ray photoelectron spectroscopy. Galvanostatic
charge discharge cycling in half cells revealed, in contrast to many
published studies, that even coatings of a thickness of 1 nm were
detrimental to the cycling performance of LNMO. The complete coverage
of the LNMO particles by the Al2O3 coating can
form a Li-ion diffusion barrier, which leads to high overpotentials
and reduced reversible capacity. Several reports on Al2O3-coated LNMO using alternative coating methods, which
would lead to a less homogeneous coating, revealed the superior electrochemical
properties of the Al2O3-coated LNMO, suggesting
that complete coverage of the particles might in fact be a disadvantage.
We show that transition metal ion dissolution during prolonged cycling
at 50 °C is not hindered by the coating, resulting in Ni and
Mn deposits on the Li counter electrode. The Al2O3-coated LNMO particles showed severe signs of pitting dissolution,
which may be attributed to HF attack caused by side reactions between
the electrolyte and the Al2O3 coating, which
can lead to additional HF formation. The pitting dissolution was most
severe for the thickest coating (1.7 nm). The uniform coating coverage
may lead to non-uniform conduction paths for Li, where the active
sites are more susceptible to HF attack. Few benefits of applications
of very thin, uniform, and amorphous Al2O3 coatings
could thus be verified, and the coating is not offering long-term
protection from HF attack.