Images of the morphology of GaN (0001) surfaces often show half-unit-cell-height steps separating a sequence of terraces having alternating large and small widths. This can be explained by the αβαβ stacking sequence of the wurtzite crystal structure, which results in steps with alternating A and B edge structures for the lowest energy step azimuths, i.e. steps normal to [0110] type directions. Predicted differences in the adatom attachment kinetics at A and B steps would lead to alternating α and β terrace widths. However, because of the difficulty of experimentally identifying which step is A or B, it has not been possible to determine the absolute difference in their behavior, e.g. which step has higher adatom attachment rate constants. Here we show that surface X-ray scattering can measure the fraction of α and β terraces, and thus unambiguously differentiate the growth dynamics of A and B steps. We first present calculations of the intensity profiles of GaN crystal truncation rods (CTRs) that demonstrate a marked dependence on the α terrace fraction fα. We then present surface X-ray scattering measurements performed in situ during homoepitaxial growth on (0001) GaN by vapor phase epitaxy. By analyzing the shapes of the (101L) and (011L) CTRs, we determine that the steady-state fα increases at higher growth rate, indicating that attachment rate constants are higher at A steps than at B steps. We also observe the dynamics of fα after growth conditions are changed. The results are analyzed using a Burton-Cabrera-Frank model for a surface with alternating step types, to extract values for the kinetic parameters of A and B steps. These are compared with predictions for GaN (0001).